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X-Ray Double Crystal Diffractometry of Multiple and Very Thin Heteroepitaxial Layers

Published online by Cambridge University Press:  06 March 2019

B. K. Tanner  and
M. J. Hill
B. K. Tanner
Affiliation:
Department of Physics, University of Durham, South RoadDurham, UK
M. J. Hill
Affiliation:
Department of Physics, University of Durham, South RoadDurham, UK
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Extract

The intense interest in production of heteroepitaxial quaternary structures of Gax In1-x Asy p1-y on InP for electro-optical telecommunications systems has Stimulated development of non-destructive techniques for their analysis. One of the most important is double axis X-ray diffractometry, a technique originally developed in the 1920s but only now coming into widespread use as a routine assessment tool. The basic theory is well treated by James and discussion of alignment errors are found in references cited by Fewster in a paper describing alignment procedures for the automated diffractometer manufactured by Bede Scientific Instruments of Durham, The application to III-V systems has been discussed by Tanner, Barnett and Bill.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 29: Thirty-Fourth Annual Conference on Applications of X-ray Analysis, August 5-9, 1985 , 1985 , pp. 337 - 343
Copyright
Copyright © International Centre for Diffraction Data 1985

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References

1. James, R.W., “The Optical Principles of the Diffraction of X-rays“ Bell, London (1962).Google Scholar
2. Fewster, P.F., Alignment of Double-Crystal Diffractometers, J. Appl. Cryst., 18 (1985), in press.Google Scholar
3. Tanner, B.K., Barnett, S.J. and Hill, M.J., X-ray Double Crystal Topographic Studies of III. – V Compounds, in “Microscopy of Semiconducting Materials, Oxfprd 1985”, Inst. Phys. Conf. ser,, Inst. Phys., London, Bristol (1985), in press.Google Scholar
4. Hill, M.J., Tanner, B.K., Halliwell, M.A.G. and Lyons, M.H., Simulation of X-ray Double Crystal Rocking Curves of Multiple and Inhomogeneous Epitaxial Layers, J. Appl. Cryst., 18 (1985), in press.Google Scholar
5. Halliwell, M.A.G., Juler, J. and Norman, A.G., Measurement of Grading in Heteroepitaxial layers, in “Microscopy of Semiconducting Materials, Oxford 1983”, Inst. phys. Conf, ser. 57. Inst, phys., London, Bristol, p.65 (1983).Google Scholar
6. Halliwell, M.A.G., Lyons, M.H. and Hill, K.J., The Interpretation of X-ray Rocking Curves from III-V Semiconductor Device structures, J. Crystal Growth 68: 523 (1984).Google Scholar
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