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The Use of Energy Dispersive Diffractometry to Measure the Thickness of Metal and Glass Thin Films

Published online by Cambridge University Press:  06 March 2019

Glen A. Stone
Glen A. Stone*
Affiliation:
South Dakota School of Mines and Technology Rapid City, South Dakota
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Extract

This paper presents a new method to measure the thickness of very thin films on a substrate material using energy dispersive x-ray diffractometry. The method can be used for many film-substrate combinations. The specific application to be presented is the measurement of phosphosilicate glass films on single crystal silicon wafers.

Type
VIII. XRD Applications
Information
Advances in X-Ray Analysis , Volume 25: Thirtieth Annual Conference on Applications of X-ray Analysis, August 3-7, 1981 , 1981 , pp. 365 - 371
Copyright
Copyright © International Centre for Diffraction Data 1981

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References

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