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Residual Stress in Thin Films of Rf-Sputtered Aluminum by X-ray Multtaxial Stress Measurement

Published online by Cambridge University Press:  06 March 2019

Shoukhi Ejiri ,
Zheng Lin ,
Tosihiko Sasaki  and
Yukio Hirose
Shoukhi Ejiri
Affiliation:
Graduate Student of Kanazawa University
Zheng Lin
Affiliation:
Graduate Student of Kanazawa University
Tosihiko Sasaki
Affiliation:
Department of Materials Science and Engineering, Kanazawa University Kakuma-machi, Kanazawa, 920-11 Japan
Yukio Hirose
Affiliation:
Department of Materials Science and Engineering, Kanazawa University Kakuma-machi, Kanazawa, 920-11 Japan
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Extract

Residual stress in thin films of RF-sputtered aluminum coated on substrate of glass was measured by X-ray multiaxial stress measurement. The films were manufactured under the various conditions such as temperature of substrate ranged from 473K to 573K, and pressure of argon gas range from 0.0093Pato 13.3Pa respectively. These results brought comprehension that residual stress existed in tri-axial and that was influenced by temperature of substrate and pressure of argon gas. Residual stresses were unstable in range of less than 1.33Pa of pressure of argon gas.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 39: Forty-Fourth Annual Conference on Applications of X-ray Analysis, July 31 - August 4, 1995 , 1995 , pp. 433 - 438
Copyright
Copyright © International Centre for Diffraction Data 1995

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