Hostname: page-component-848d4c4894-ndmmz Total loading time: 0 Render date: 2024-05-14T05:21:55.766Z Has data issue: false hasContentIssue false
  • English
  • Français

Reactions in Thin Metal Films Bombarded by the High Intensity Electron Microscope Beam

Published online by Cambridge University Press:  06 March 2019

F. M. Berting  and
K. R. Lawless
F. M. Berting
Affiliation:
Uniroyal, Incorporated, Middlebury, Connecticut
K. R. Lawless
Affiliation:
University of Virginia, Charlottesville, Virginia
Get access

Extract

The electron beam of the electron microscope is an excellent source of energy for producing localized observable reactions in thin films.

The normal operating beam of a double condenser lens System focussed for studying a metal film in good thermal contact with its mount gives a calculated temperature rise of about 20° to 50°C. However, by changing these specified conditions, the sample may be heated to temperatures well over 1000°C. Copper and gadolinium--melting points 1083°C and 1312°C respectively--have been melted in the electron microscope beam, as have BeO whiskers--melting point 2530° + 30° C--by the authors and their colleagues.

Type
Research Article
Information
Advances in X-Ray Analysis , Volume 16: 'Twenty-First Annual Conference on Applications of X-ray Analysis, August 2-4, 1972 , 1972 , pp. 217 - 228
Copyright
Copyright © International Centre for Diffraction Data 1972

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Curzon, A. E. and Chlebek, H. G., “The Observation of Face Centered Cubic. Erbium in Thin Films and Its Oxidatton”, J. Less-Common Metals 27, 411 (1972).Google Scholar
2. Marcus, R. B., “Properties of Epitaxial BCC Tantalum Films”, J. Appl. Phys. 37 3121–3127 (1966).Google Scholar
3. Villagrana, R. E. and Thomas, G., “Interstitial Ordering of Carbon in Tantalum”, phys. stat. sol. 9, 499–518 (1965).Google Scholar
4. van Torne, L. I. and Thomas, G., “Phase Transformations in Niobium Involving Interstitials”, Acta. Met. 12, 601–615 (1964).Google Scholar
5. Van Landuyt, J., “Electron Microscopic Investigation of Phenotnena Associated with Solid Solution of Oxygen in Niobium”, phys. stat. sol. 6, 957–974 (1964).Google Scholar
6. Seraphim, D. P., Stemple, N. R., and Novick, D. T., “Phase Instability in Dilute Interstitial Solid Solutions of Nitrogen in Tantalum”, J. Appl. Phys. 33, 136–141 (1962).Google Scholar
7. Hirsch, P. B., Howie, A., Micholson, R. B., Pashley, D. W., and Whelan, M. J., “Electron Microscopy of Thin Crystals”, p. 16–17, Plenum Press (1965).Google Scholar
8. Elmiskop, Siemens IA operating manual. Volume. II, Section 1.3 Figure 2.Google Scholar
9. Makin, M. J., p. 444 in Valdre, U., editor, “Electron Microscopy in Materials Science”, Academic Press (1970).Google Scholar
10. Damask, A. C. and Dienes, G. J., “Point Defects in Metals”, pp. 12–13, Gordon and Breach (1963).Google Scholar
11. Norman, N., “Metallic Oxide Phases of Niobium and Tantalum Part I: X-Ray Investigations”, J. Less-Common Metals 4, 52–61 (1962).Google Scholar
12. Lehovec, K., “Lattice Structure of –Ta2O5 ”, J. Less-Common Metals 7, 397–410 (1964).Google Scholar
13. Stringer, J., “The High-Temperature Oxidiation of Tantalum Single Crystals”, J. Less-Common Metals 12, 301–317 (1967).Google Scholar
14. Van Landuyt, J. and Wayman, C. M., “On the Habit Planes of the Suboxide Pbases of TaOy and TaOz ”, J. Less-Common Metals 14, 248–250 (1968).Google Scholar
15. Van Landuyt, J. and Wayman, C. M., “A Study of Oxide Plate Formation in Tantalum”, Acta Met, 16, 803–814, 815-822,(1968).Google Scholar
16. Steeb, S and Renner, R., “Ermittlung der Struktur des Tantalsuboxydes TaOz (Ta2o) mittels Elektronenbergung”, J. Less-Common Metals, 9, 181–189 (1965).Google Scholar
17. Steeb, S and Renner, R., “Ermittlung der Struktur des Tantalsuboxydes TaOy (Ta32O9) mittels Elektronenbeugung”, J. Less-Common Metals 10, 246–249 (1966).Google Scholar
18. Brauer, G., Muller, H. Kühner, G., “Oxyde der Tieftemperatur-oxydation von Niob und Tantal”, J. Less-Common Metals, 533–546 (1962).Google Scholar
19. Niebuhr, J., “Die Niederen Oxides des Tantals”, J. Less-Common Metals 10, 312–322 (1966).Google Scholar
20. Schönberg, N., “An X-Ray Investigation of the Tantalum-Oxygen System”, Acta. Chem. Scand. 8, 240–245 (1954).Google Scholar
21. Terao, N., “Structure of Tantalum Nitrides”, Jap. J. Appl. Phys. 10, 248–259 (1971).Google Scholar
22. Terao, W., “Etude par Diffraction Electronique de la Structure des Carbures de Tantale”, Jap. J. Appl. Phys. 10, 1263–1267 (1970).Google Scholar