Hostname: page-component-848d4c4894-wg55d Total loading time: 0 Render date: 2024-05-06T09:43:09.886Z Has data issue: false hasContentIssue false

Near-Surface Chemical Characterization Using Grazing Incidence X-ray Fluorescence

Published online by Cambridge University Press:  06 March 2019

Kenji Sakurai
Affiliation:
National Research Institute for Metals: 1-2-1, Sengen, Tsukuba, Ibaraki 305, Japan
Atsuo lida
Affiliation:
Photon Factory, National Laboratory for High Energy Physics: 1-1, Oho, Tsukuba, Ibaraki 305, Japan.
Get access

Extract

External X-ray total reflection occurs when collimated X-ray beams impinge on a smooth, flat surface of matter at a small glancing angle, typically a few mrad. With respect to the X-ray fluorescence technique, total reflection experiments have allowed the trace determination of solution samples using an X-ray mirror as a sample support. The grazing incidence X-ray fluorescence technique (GIF) is also suitable for near-surface element analysis of the material, because the penetration depth of X-rays is 10-1000 Å around the critical angle.

Type
Research Article
Copyright
Copyright © International Centre for Diffraction Data 1989

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Parratt, L. G., Surface Studies of Solids by Total Reflection of X-Rays, Phys. Rev. 95: 359 (1954).Google Scholar
2. Yoneda, I. and Horiuchi, T., Optical Flats for Use in X-Ray Spectrochemical Microanalysis, Rev. Sci. Instrum. 42: 1069 (1971).Google Scholar
3. Aiginger, H. and Wobrauschek, P., Total Reflectance X-Ray Spectrometry, Adv. in X-Ray Anal., 28: 1 (1985).Google Scholar
4. Iida, A. and Gohshi, Y., Total-Reflection X-Ray Fluorescence Analysis Using Monochromatic Beam, Jpn. J. Appl. Phys. 23: 1543 (1984).Google Scholar
5. Iida, A., Yoshinaga, A., Sakurai, K. and Gohshi, Y., Synchrotron Radiation Excited X-Ray Fluorescence Analysis Using Total Reflection of X-Rays, Anal. Chem. 58: 394 (1986).Google Scholar
6. Iida, A., Sakurai, K., Gohshi, I. and Komiya, S., Analysis of Contamination Layer of InP During LPE Process by Synchrotron Radiation-Excited X-Ray Fluorescence, Jpn. J. Appl. Phys. 27:L1825 (1988)Google Scholar
7. Bloch, J. M., Sansone, M., Rondelea, F., Peiffer, D. G., Pincus, P., Kira, M. W., Eisenberger, P. M., Concentration Profile of a Dissolved Polymer, Phys. Rev. Lett. 54: 1039 (1985).Google Scholar
8. Bloch, J. M., Xun, W. B., lang, X., Ramanathan, M., Montano, P. A. and Capasso, C., Adsorption of Counterions to a Stearate Monolayer Spread at the Water-Air Interface: A Synchrotron X-Ray Study, Phys. Rev. Lett. 61: 2941 (1988).Google Scholar
9. Iida, A., Sakurai, K., Yoshinaga, A. and Gohshi, Y., Grazing Incidence X-Ray Fluorescence Analysis, Nuel. Inst, and Methods A246: 736 (1986).Google Scholar
10. Iida, A., Sakurai, K., and Gohshi, Y., Near-Surface Analysis of Semiconductor Using Grazing Incidence X-Ray Fluorescence, Adv. in X-Ray Anal. 31: 487 (1988).Google Scholar
11. Sakurai, K., Iida, A. and Gohshi, Y., Chemical State Analysis by X-Ray. Fluorescence Using Shifts of Iron K Absorption Edge, Anal. Sci. 4: 37 (1988).Google Scholar
12. Sakurai, K., Iida, A. and Gohshi, Y., Chemical State Analysis by X-Ray Fluorescence Using Absorption Edge Shifts, Adv. In X-Ray Anal. 32 (1989) (in press)Google Scholar
13. Born, M. and Wolf, E., Principles of Optics 6th ed.”, Pergatnon, New York (1980)Google Scholar
14. Sasaki, S., Anomalous Scattering Factors for Synchrotron Radiation Users: Calculated using Cromer and Liberman's Method, KEK Report 83-22 (1984)Google Scholar
15. Martens, G. and Rabe, P., EXAFS Studies on Superficial Regions by Means of Total Reflection, Phys. Stat. Sol(a) 58: 415 (1980).Google Scholar
16. Heald, S. M., Chen, H. and Tranquada, J. M., Glancing-angle extended x-ray-absorption fine structure and reflectivity studies of interfacial regions, Phys. Rev. B38: 1016 (1988).Google Scholar