Homo-epitaxial growth of Si nanowires on Si (100) substrate was accomplished using a combination of anodic aluminum oxide (AAO) template and Vapor-Liquid-Solid (VLS) growth. We prepared two types of AAO template for epitaxial growth of Si nanowires.
We observed vertically grown epitaxial Si (100) nanowires in the AAO template. In addition, after leaving filled pores, Si nanowires changed their growth direction from  to <111>. This result shows that the walls of the pores forced the growth direction of Si nanowires parallel to the direction of the pores, and after complete filling, the growth direction changes to that of the Si nanowires on a bare Si substrate.