6 results
Tunable Workfunction with TaN Metal Gate on HfO2-HfxSiyO Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 811 / 2004
- Published online by Cambridge University Press:
- 28 July 2011, D4.3
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- 2004
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Adhesion and reliability of copper interconnects with Ta and TaN barrier layers
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- Journal:
- Journal of Materials Research / Volume 15 / Issue 1 / January 2000
- Published online by Cambridge University Press:
- 31 January 2011, pp. 203-211
- Print publication:
- January 2000
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Subcritical Debonding of Multilayer Interconnect Structures: Temperature and Humidity Effects
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- Journal:
- MRS Online Proceedings Library Archive / Volume 563 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 251
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- 1999
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Effect of Nitrogen Content on Interfacial Adhesion of the Ta/SiO2 Interface
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- Journal:
- MRS Online Proceedings Library Archive / Volume 564 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 281
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- 1999
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Debonding of Interfaces in Multilayer Interconnect Structures
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- Journal:
- MRS Online Proceedings Library Archive / Volume 514 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 141
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- 1998
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Effects of Interface Nonplanarity on the Interface Fracture Energy of the TiN/SiO2System
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- Journal:
- MRS Online Proceedings Library Archive / Volume 505 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 357
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- 1997
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