8 results
Enhanced Antimony Activation for Ultra-Shallow Junctions in Strained Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 912 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0912-C02-03
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- 2006
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Diffusion of ion-implanted Boron and Silicon in Germanium
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- Journal:
- MRS Online Proceedings Library Archive / Volume 809 / 2004
- Published online by Cambridge University Press:
- 17 March 2011, B8.10
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- 2004
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Ultrashallow Junction Formation and Gate Activation in Deep-Submicron CMOS
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- Journal:
- MRS Online Proceedings Library Archive / Volume 610 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, B3.1
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- 2000
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On the «A Symmetrical» Behavior of Transient Enhanced Diffusion in Pre-Amorphised SI Wafers
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- Journal:
- MRS Online Proceedings Library Archive / Volume 532 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 67
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- 1998
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The Effect of Oxygen on The Electrical Activation and Diffusion of Ion-Implanted Boron
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- Journal:
- MRS Online Proceedings Library Archive / Volume 469 / 1997
- Published online by Cambridge University Press:
- 15 February 2011, 291
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- 1997
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Room-Temperature Migration of Ion-Implanted Boron in Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 469 / 1997
- Published online by Cambridge University Press:
- 15 February 2011, 53
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- 1997
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Low Energy Implantation and Transient Enhanced Diffusion: Physical Mechanisms and Technology Implications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 469 / 1997
- Published online by Cambridge University Press:
- 15 February 2011, 265
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- 1997
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Diffusion and Activation During Rapid Thermal Annealing of Implanted Boron in Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 52 / 1985
- Published online by Cambridge University Press:
- 26 February 2011, 65
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- 1985
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