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Focused Ion Beam (FIB) system is equipment used to make a wide variety of micro and Nano structures. Structures can be created using various materials by irradiating focused gallium ion beam on to the surface of specimens and by sputtering, etching and ion beam induced deposition. In order to realize greater diversity for nano construction by using the FIB system, we have developed technologies incorporating:
- Built-in pattern signal generator
- Multiple Gas Unit for gas assisted etching and beam induced deposition
- A precision wheel for the stage.
This latest FIB system has a narrow Ion beam with a diameter of better than 4nm. Beam current is controlled from 0.15pA to 20nA. These performances contribute significantly to the study 3D structures fabrication and modification.
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