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Etching Characteristics During Cleaning of Silicon Surfaces by NF3-added Hydrogen and Water-Vapor Plasma Downstream Treatment
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- Journal:
- MRS Online Proceedings Library Archive / Volume 477 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 167
- Print publication:
- 1997
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- Article
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Removal of Metallic Contaminants and Native Oxide from Silicon Wafer Surface by Pure Water Containing a Little Dissolved Oxygen
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- Journal:
- MRS Online Proceedings Library Archive / Volume 386 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 69
- Print publication:
- 1995
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- Article
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