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Probing Process-Induced Defects in Si Using Infrared Photoelastic Stress Measurement Technique
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- Journal:
- MRS Online Proceedings Library Archive / Volume 864 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, E9.38
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- 2005
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Stress Distribution in Ultra Thin SiO2 Film/Si Substrate System Measured by a Low Level Birefringence Detection Technique
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- Journal:
- MRS Online Proceedings Library Archive / Volume 821 / 2004
- Published online by Cambridge University Press:
- 15 March 2011, P8.8
- Print publication:
- 2004
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Infrared Photoelastic Study of Thin-Film-Edge-Induced Stresses in Silicon Substrates
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- Journal:
- MRS Online Proceedings Library Archive / Volume 695 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, L4.5.1
- Print publication:
- 2001
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Thin-Film-Edge-Induced Stresses in Substrates
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- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K7.5
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- 2001
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Measurement of Bonding Stress in Silicon High Power Device Structures by Infrared Photoelasticity Method
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- Journal:
- MRS Online Proceedings Library Archive / Volume 563 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 303
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- 1999
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Stress Distribution in Si Under Patterned thin Film Structures
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- Journal:
- MRS Online Proceedings Library Archive / Volume 436 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 239
- Print publication:
- 1996
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