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Modeling and Experimental Study of SiH4/GeH4/H2 Gas Discharge for Hydrogenated Silicon Germanium Deposition by RF PECVD
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1426 / 2012
- Published online by Cambridge University Press:
- 10 May 2012, pp. 403-408
- Print publication:
- 2012
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- Article
- Export citation