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PVD Ti-Si-N Films Process Development for Copper Interconnect Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 514 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 513
- Print publication:
- 1998
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- Article
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Thin Film Properties of LPCVD TiN Barrier for Silicon Device Technology
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- Journal:
- MRS Online Proceedings Library Archive / Volume 250 / 1991
- Published online by Cambridge University Press:
- 15 February 2011, 199
- Print publication:
- 1991
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- Article
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