5 results
Mim Capacitors with HfO2 and HfAlOx for Si RF and Analog Applications
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 766 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, E5.9
- Print publication:
- 2003
-
- Article
- Export citation
Optimization of Deposition Thickness and Over Polishing Time to Minimize Wafer Level Topography in Copper CMP
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 732 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, I4.13
- Print publication:
- 2002
-
- Article
- Export citation
A Correlation Study of Thermal Stability on Porous Low k
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 716 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, B12.2
- Print publication:
- 2002
-
- Article
- Export citation
Diffusion Studies of Cu in Si and Low-k Dielectric Materials
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 716 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, B8.3
- Print publication:
- 2002
-
- Article
- Export citation
Analysis of Copper to Tantalum Transition in Copper Cmp
-
- Journal:
- MRS Online Proceedings Library Archive / Volume 671 / 2001
- Published online by Cambridge University Press:
- 18 March 2011, M3.5
- Print publication:
- 2001
-
- Article
- Export citation