13 results
The Staebler-Wronski Effect: New Physical Approaches and Insights as a Route to Reveal its Origin
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1245 / 2010
- Published online by Cambridge University Press:
- 01 February 2011, 1245-A14-02
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- 2010
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Ion Assisted ETP-CVD a-Si:H at Well Defined Ion Energies
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1153 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1153-A17-06
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- 2009
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Manipulating the Hydrogen-Bonding Configuration in ETP-CVD a-Si:H
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- Journal:
- MRS Online Proceedings Library Archive / Volume 989 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0989-A22-04
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- 2007
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Thin Film Cavity Ringdown Spectroscopy and Second Harmonic Generation on Thin a-Si:H Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 762 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, A19.8
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- 2003
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Expanding thermal plasma for low-k dielectrics deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 766 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, E6.9
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- 2003
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Simulations of Buffer Layers in a-Si:H Thin Film Solar Cells Deposited with an Expanding Thermal Plasma
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- Journal:
- MRS Online Proceedings Library Archive / Volume 762 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, A7.5
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- 2003
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Expanding Thermal Plasma Deposition of Silicon Dioxide-Like Films for Microelectronic Devices
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- Journal:
- MRS Online Proceedings Library Archive / Volume 715 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, A19.3
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- 2002
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In Situ Probing and Atomistic Simulation of a-Si:H Plasma Deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 664 / 2001
- Published online by Cambridge University Press:
- 17 March 2011, A1.1
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- 2001
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Novel Amorphous Silicon Solar Cell using a Manufacturing Procedure with a Temporary Superstrate
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- Journal:
- MRS Online Proceedings Library Archive / Volume 557 / 1999
- Published online by Cambridge University Press:
- 15 February 2011, 713
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- 1999
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Hydrogen Incorporation During Deposition of a-Si:H From an Intense Source of SiH3
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- Journal:
- MRS Online Proceedings Library Archive / Volume 467 / 1997
- Published online by Cambridge University Press:
- 15 February 2011, 621
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- 1997
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On the Effect of Substrate Temperature on a-Si:H Deposition Using an Expanding Thermal Plasma
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- Journal:
- MRS Online Proceedings Library Archive / Volume 420 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 341
- Print publication:
- 1996
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Hard Amorphous Hydrogenated Carbon Films Deposited from an Expanding Thermal Plasma
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- Journal:
- MRS Online Proceedings Library Archive / Volume 436 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 287
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- 1996
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An Expanding Thermal Plasma for Deposition of a-Si:H
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- Journal:
- MRS Online Proceedings Library Archive / Volume 377 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 33
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- 1995
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