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Quantitative Electron Energy Loss Spectroscopy (EELS) Analysis of Flowable CVD Oxide for Shallow Trench Isolation of finFET Integration
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- Journal:
- Microscopy and Microanalysis / Volume 23 / Issue S1 / July 2017
- Published online by Cambridge University Press:
- 04 August 2017, pp. 1462-1463
- Print publication:
- July 2017
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Stress Generation in PECVD Silicon Nitride Thin Films for Microelectronics Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 863 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, B7.9/O11.9
- Print publication:
- 2005
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Comparison of the Hafnium Diboride(0001) and Hafnium(0001) Surfaces
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- Journal:
- MRS Online Proceedings Library Archive / Volume 441 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 463
- Print publication:
- 1996
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