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Low Temperature Silicon Nitride Films Deposited on 3D Topography by Hot Wire Chemical Vapor Deposition (HWCVD)
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1036 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 1036-M03-01
- Print publication:
- 2007
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- Article
- Export citation