2 results
Dielectric Properties of Ultra Dense (3 g/cm3) Silicon Nitride Deposited by Hot Wire CVD at Industrially Relevant High Deposition Rates
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- Journal:
- MRS Online Proceedings Library Archive / Volume 989 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0989-A04-05
- Print publication:
- 2007
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- Article
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Reaction Mechanism for Deposition of Silicon Nitride by Hot-Wire CVD with Ultra High Deposition Rate(>7 nm/s)
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- Journal:
- MRS Online Proceedings Library Archive / Volume 910 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0910-A03-03
- Print publication:
- 2006
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- Article
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