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Improved Reliability With a New Plasma Nh3 Process for 0.35μιη P+ Poly-Gate Nitrided Oxide P-Mosfet's
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- Journal:
- MRS Online Proceedings Library Archive / Volume 446 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 91
- Print publication:
- 1996
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- Article
- Export citation