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Modeling and Real-Time Process Monitoring of Organometallic Chemical Vapor Deposition of III-V Phosphides and Nitrides at Low and High Pressures
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- Journal:
- MRS Online Proceedings Library Archive / Volume 569 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 59
- Print publication:
- 1999
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- Article
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