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Deposition of functional hydrogenated amorphous carbon-nitride film (a-CN:H) using C2H4/N2 townsend dielectric barrier discharge
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- Journal:
- The European Physical Journal - Applied Physics / Volume 47 / Issue 2 / August 2009
- Published online by Cambridge University Press:
- 28 April 2009, 22820
- Print publication:
- August 2009
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- Article
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