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Hydrogenated Amorphous Silicon and Silicon Nitride Deposited at less than 100° C by ECR-PECVD for Thin Film Transistors
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- Journal:
- MRS Online Proceedings Library Archive / Volume 609 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, A28.2
- Print publication:
- 2000
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- Article
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