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Physico-chemical environment of Al impurity atoms in amorphous silica

Published online by Cambridge University Press:  29 November 2002

Ph. Jonnard ,
J.-P. Morreeuw  and
H. Bercegol
Ph. Jonnard*
Affiliation:
Laboratoire de Chimie Physique-Matière et Rayonnement, Université Pierre et Marie Curie, UMR-CNRS 7614, 11 rue Pierre et Marie Curie, 75231 Paris Cedex 05, France
J.-P. Morreeuw
Affiliation:
CEA/CESTA, BP 2, 33114 Le Barp, France
H. Bercegol
Affiliation:
CEA/CESTA, BP 2, 33114 Le Barp, France
*
jonnard@ccr.jussieu.fr
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Abstract

The physico-chemical environment around the aluminum impurity atoms in commercial Herasil silica is studied by electron-induced X-ray emission spectroscopy. Despite the low concentration of aluminum and the charging effect occurring upon electron irradiation, we have been able to characterize the environment of the Al atoms. We show that the Al atoms are in an octahedral environment, i.e. surrounded by 6 oxygen atoms. The presence of Al clusters, whose metallic character would make them candidates to be ultraviolet absorption centers, is ruled out.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 21 , Issue 2 , February 2003 , pp. 147 - 149
Copyright
© EDP Sciences, 2003

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