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Nanoimprint and micro-contact printing tri-layer processes*

Published online by Cambridge University Press:  15 December 2000

Y. Chen ,
A. Lebib ,
S. Li ,
A. Pépin ,
D. Peyrade ,
M. Natali  and
E. Cambril
Y. Chen*
Affiliation:
Laboratoire de Microstructures et de Microélectronique, CNRS, 196 avenue Henri Ravera, 92225 Bagneux, France
A. Lebib
Affiliation:
Laboratoire de Microstructures et de Microélectronique, CNRS, 196 avenue Henri Ravera, 92225 Bagneux, France
S. Li
Affiliation:
Laboratoire de Microstructures et de Microélectronique, CNRS, 196 avenue Henri Ravera, 92225 Bagneux, France
A. Pépin
Affiliation:
Laboratoire de Microstructures et de Microélectronique, CNRS, 196 avenue Henri Ravera, 92225 Bagneux, France
D. Peyrade
Affiliation:
Laboratoire de Microstructures et de Microélectronique, CNRS, 196 avenue Henri Ravera, 92225 Bagneux, France
M. Natali
Affiliation:
Laboratoire de Microstructures et de Microélectronique, CNRS, 196 avenue Henri Ravera, 92225 Bagneux, France
E. Cambril
Affiliation:
Laboratoire de Microstructures et de Microélectronique, CNRS, 196 avenue Henri Ravera, 92225 Bagneux, France
*
yong.chen@L2m.cnrs.fr
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Abstract

Replication of patterns at a nanometer scale is a challenge for both advanced optical lithography and post-optical techniques. Considerable industrial effort has been devoted to the so-called leading-edge optical methods and the next generation lithography techniques. In parallel, a number of low-cost techniques such as nanoimprint and micro-contact printing are being investigated. In these methods, pattern replication is performed in non-conventional ways so that diffraction and scattering problems are no longer relevant. However, several other critical issues have to be studied. This paper describes two tri-layer pattern-transfer techniques, which can be used to improve the process latitude and the process compatibility. Pattern replication and lift-off transfer with feature sizes down to 30 nm and 150 nm have been achieved respectively by nanoimprint and micro-contact printing. As application examples, high-density magnetic dot structures are obtained and studied by measuring magneto-optical Kerr hysteresis loops.

Keywords

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 12 , Issue 3 , December 2000 , pp. 223 - 229
Copyright
© EDP Sciences, 2000

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Footnotes

*

This paper has been presented at the workshop "Electronique et Nanotechnologies Moléculaires", Paris, October 1999, sponsored by the "GDR 2054 du CNRS".

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