Hostname: page-component-7479d7b7d-rvbq7 Total loading time: 0 Render date: 2024-07-08T17:14:43.010Z Has data issue: false hasContentIssue false

Influence of nitrogen impurities on the formation of active species in Ar-O2 plasmas

Published online by Cambridge University Press:  28 October 2011

V. Guerra*
Affiliation:
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, 1049-001 Lisboa, Portugal Departamento de Fsica, IST, Universidade Técnica de Lisboa, Portugal
K. Kutasi
Affiliation:
Research Institute for Solid State Physics and Optics, Hungarian Academy of Sciences, P.O. Box 49, 1525 Budapest, Hungary
P.A. Sá
Affiliation:
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, 1049-001 Lisboa, Portugal Departamento de Engenharia Fsica, Faculdade de Engenharia da Universidade do Porto, 4200-465 Porto, Portugal
M. Lino da Silva
Affiliation:
Instituto de Plasmas e Fusão Nuclear, Instituto Superior Técnico, 1049-001 Lisboa, Portugal
*
Get access

Abstract

A self-consistent kinetic model was developed in order to study the production of active species in Ar-O2 surface-wave microwave plasmas with a relatively small N2 addition. It is shown that the Ar-O2-N2 mixture produces efficiently the same active species as an Ar-O2 discharge, including oxygen atoms, metastable O2(a1g) molecules and the VUV emitting Ar(4s) states. Furthermore, active N-containing species are additionally produced, in particular N atoms and NO ground-state and excited molecules, which makes the ternary mixture very interesting for numerous plasma applications.

Type
Research Article
Copyright
© EDP Sciences, 2011

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Moreau, S., Moisan, M., Tabrizian, M., Barbeau, J., Pelletier, J., Ricard, A., Yahia, L., J. Appl. Phys. 88, 1166 (2000)CrossRef
Nagatsu, M., Terashita, F., Nonaka, H., Xu, L., Nagata, T., Koide, Y., Appl. Phys. Lett. 86, 211502 (2005)CrossRef
Rossi, F., Kylián, O., Hasiwa, M., Plasma Process. Polym. 3, 431 (2006)CrossRef
Raballand, V., Benedikt, J., Wunderlich, J., von Keudell, A., J. Phys. D: Appl. Phys. 41, 115207 (2008)CrossRef
Vratnica, Z., Vujošević, D., Cvelbar, U., Mozetič, M., IEEE Trans. Plasma Sci. 36, 1300 (2008)CrossRef
Mozetič, M., Cvelbar, U., Sunkara, M., Vaddiraju, S., Adv. Mater. 17, 2138 (2005)CrossRef
Cvelbar, U., Ostrikov, K., Mozetič, M., Nanotechnology 19, 405605 (2008)CrossRef
Canal, C., Gaboriau, F., Ricard, A., Mozetic, M., Cvelbar, U., Drenik, A., Plasma Chem. Plasma Process. 27, 404 (2007)CrossRef
Belmonte, T., Czerwiec, T., Gavillet, J., Michel, H., Surf. Coat. Technol. 97, 642 (1997)CrossRef
Puač, N., Petrović, Z., Radetić, M., Djordjević, A., Mater. Sci. Forum 494, 291 (2005)CrossRef
Mafra, M., Belmonte, T., Poncin-Epaillard, F., Maliska, A., Cvelbar, U., Plasma Process. Polym. 6, S198 (2009)CrossRef
Klanjšek-Gunde, M., Kunaver, M., Hrovat, A., Cvelbar, U., Prog. Org. Coat. 54, 113 (2005)CrossRef
Kitajima, T., Nakano, T., Makabe, T., Appl. Phys. Lett. 88, 091501 (2006)CrossRef
Mozetic, M., Zalar, A., Cvelbar, U., Babic, D., Surf. Interface Anal. 36, 986 (2004)CrossRef
Vesel, A., Drenik, A., Mozetic, M., Zalar, A., Balat-Pichelin, M., Bele, M., Vacuum 82, 228 (2007)CrossRef
Parker, J.G., John Hopkins APL Tech. Dig. 5, 48 (1984)
Niedre, M.J., Yu, C.S., Patterson, M.S., Wilson, B.C., British J. Cancer 92, 298 (2005)
Ionin, A.A., Kochetov, I.V., Napartovich, A.P., Yuryshev, N.N., J. Phys. D: Appl. Phys. 40, R25 (2007)CrossRef
Woodard, B.S., Zimmerman, J.W., Benavides, G.F., Carroll, D.L., Verdeyen, J.T., Palla, A.D., Field, T.H., Solomon, W.C., Lee, S., Rawlins, W.T., Davis, S.J., J. Phys. D: Appl. Phys. 43, 025208 (2010)CrossRef
Hicks, A., Bruzzese, J.R., Adamovich, I.V., J. Phys. D: Appl. Phys. 43, 025206 (2010)CrossRef
Guerra, V., Kutasi, K., , P.A., Appl. Phys. Lett. 96, 071503 (2010)CrossRef
Kutasi, K., Guerra, V., , P.A., J. Phys. D: Appl. Phys. 43, 175201 (2010)CrossRef
Kutasi, K., Guerra, V., , P.A., Plasma Sources Sci. Technol. 20, 035006 (2011)CrossRef
Ricard, A., Monna, V., Plasma Sources Sci. Technol. 11, A150 (2002)CrossRef
, P.A., Loureiro, J., J. Phys. D: Appl. Phys. 30, 2320 (1997)CrossRef
Henriques, J., Tatarova, E., Guerra, V., Ferreira, C.M., J. Appl. Phys. 91, 5622 (2002)CrossRef
Henriques, J., Tatarova, E., Dias, F.M., Ferreira, C.M., J. Appl. Phys. 91, 5632 (2002)CrossRef
Guerra, V., Loureiro, J., Plasma Sources Sci. Technol. 6, 373 (1997)CrossRef
Pintassilgo, C.D., Loureiro, J., Guerra, V., J. Phys. D: Appl. Phys. 38, 417 (2005)CrossRef
Kutasi, K., Saoudi, B., Pintassilgo, C.D., Loureiro, J., Moisan, M., Plasma Process. Polym. 5, 840 (2008)CrossRef
Loureiro, J., Ferreira, C.M., J. Phys. D: Appl. Phys. 19, 17 (1986)CrossRef
Lino da Silva, M., Guerra, V., Loureiro, J., , P.A., Chem. Phys. 348, 187 (2008)CrossRef
Tatarova, E., Dias, F.M., Ferreira, C.M., Ricard, A., J. Appl. Phys. 85, 49 (1999)CrossRef
Dilecce, G., Benedictis, S.D., Plasma Sources Sci. Technol. 8, 266 (1999)CrossRef
Gordiets, B.F., Ferreira, C.M., Nahorny, J., Pagnon, D., Touzeau, M., Vialle, M., J. Phys. D: Appl. Phys. 29, 1021 (1996)CrossRef
Gordiets, B.F., Ferreira, C.M., AIAA J. 36, 1643 (1998)CrossRef
Kutasi, K., Loureiro, J., J. Phys. D: Appl. Phys. 40, 5612 (2007)CrossRef
Guerra, V., IEEE Trans. Plasma Sci. 35, 1397 (2007)CrossRef
Macko, P., Veis, P., Cernogora, G., Plasma Sources Sci. Technol. 13, 251 (2004)CrossRef
Henriques, J., Tatarova, E., Dias, F.M., Ferreira, C.M., J. Appl. Phys. 90, 4921 (2001)CrossRef
Pinheiro, M.J., Gousset, G., Granier, A., Ferreira, C.M., Plasma Sources Sci. Technol. 7, 524 (1998)CrossRef
Guerra, V., Tatarova, E., Dias, F.M., Ferreira, C.M., J. Appl. Phys. 91, 2648 (2002)CrossRef
Guerra, V., , P.A., Loureiro, J., Eur. Phys. J. Appl. Phys. 28, 125 (2004)CrossRef
Pintassilgo, C.D., Guaitella, O., Rousseau, A., Plasma Sources Sci. Technol. 18, 025005 (2009)CrossRef
Welzel, S., Guaitella, O., Lazzaroni, C., Pintassilgo, C.D., Rousseau, A., Röpcke, J., Plasma Sources Sci. Technol. 20, 015020 (2011)CrossRef
Guerra, V., Loureiro, J., Plasma Sources Sci. Technol. 6, 373 (1999)CrossRef
Stapelmann, K., Kylián, O., Denis, B., Rossi, F., J. Phys. D: Appl. Phys. 41, 192005 (2008)CrossRef
Kylián, O., Rossi, F., J. Phys. D: Appl. Phys. 42, 085207 (2009)CrossRef
Bernardelli, E.A., Ricard, A., Belmonte, T., Plasma Sources Sci. Technol. 20, 025012 (2011)CrossRef
Guaitella, O., Hübner, M., Welzel, S., Marinov, D., Röpcke, J., Rousseau, A., Plasma Sources Sci. Technol. 19, 45026 (2010)CrossRef