Hostname: page-component-76fb5796d-vvkck Total loading time: 0 Render date: 2024-04-25T20:44:05.010Z Has data issue: false hasContentIssue false

Diagnostic of 13.56 MHz RF sustained Ar–N2 plasma by optical emission spectroscopy

Published online by Cambridge University Press:  14 January 2009

F. U. Khan
Affiliation:
Department of Physics, Gomal University, D.I. Khan, Pakistan
N. U. Rehman
Affiliation:
Department of Physics, Quaid-i-Azam University, 45320 Islamabad, Pakistan
S. Naseer
Affiliation:
Department of Physics, Peshawar University, Peshawar, Pakistan
M. A. Naveed
Affiliation:
Department of Physics, Quaid-i-Azam University, 45320 Islamabad, Pakistan
A. Qayyum
Affiliation:
National Tokamak Fusion Program, 3329 Islamabad, Pakistan
N. A.D. Khattak
Affiliation:
Department of Physics, Gomal University, D.I. Khan, Pakistan
M. Zakaullah*
Affiliation:
Department of Physics, Quaid-i-Azam University, 45320 Islamabad, Pakistan
Get access

Abstract

Optical Emission Spectroscopy (OES) is used to investigate the effect of argon gas mixing on the electron temperature, the degree of nitrogen dissociation and the active species concentration in a 13.56 MHz radio frequency (RF) sustained nitrogen plasma. The electron temperature is determined from Ar-I emission line intensities by using the modified Boltzmann's plot method and is found to be increased with argon mixing in nitrogen plasma. The concentration of active species $\rm N_2(C ^3\Pi_{\it u})$ and $\rm N_2^+ (B ^2\Sigma_{\it u}^+)$ is monitored in terms of the emission intensities of nitrogen (0–0) bands of the second positive and the first negative systems respectively. The concentration of $\rm N_2 (C^3\Pi_{\it u})$ active species along with the degree of N2-dissociation is appreciably enhanced by argon mixing signifying the role of argon metastables in the excitation and dissociation processes.

Keywords

Type
Research Article
Copyright
© EDP Sciences, 2009

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Sharma, M.K., Saikia, B.K., Phuukan, A., Ganguli, B., Surf. Coat. Technol. 201, 2407 (2006) CrossRef
Stock, H.R., Jarms, C., Seidel, F., Doring, J.E., Surf. Coat. Technol. 94-95, 247 (1997) CrossRef
D. Douai, J. Berndt, J. Winter, in 14th Int. Symp. Plasma Chemistry, August 2–6, Praha, Czech Republic, 1999
Donnelly, V.M., J. Phys. D: Appl. Phys. 37, R217 (2004) CrossRef
Bai, K.H., You, S.J., Chang, H.Y., Phys. Plasmas 9, 2831 (2002) CrossRef
Henriques, J., Tatarova, E., Guerra, V., Ferreira, C.M., J. Appl. Phys. 91, 5622 (2002) CrossRef
Tabbal, M., Kazpoulo, M., Chritidis, T., Isber, S., J. Appl. Phys. 78, 2131 (2001)
Liu, J., Sun, F., Yu, H., Curr. Appl. Phys. 5, 625 (2005) CrossRef
Inaba, S., Goto, T., Hattori, S., J. Phys. Soc. Jpn 51, 627 (1982) CrossRef
Inaba, S., Goto, T., Hattori, S., J. Phys. Soc. Jpn 52, 1164 (1983) CrossRef
Qayyum, A., Zeb, S., Naveed, M.A., Rehman, N.U., Ghauri, S.A., Zakaullah, M., J. Quant. Spect. Radiat. Transfer 107, 361 (2007) CrossRef
Hargis, P.J. et al., Rev. Sci. Instrum. 65, 140 (1994) CrossRef
Brake, M.L., Pender, J.T.P., Buie, M.J., Ricci, A., Soniker, J., Pochan1, P.D., Miller, P.A., J. Res. Natl. Inst. Stand. Technol. 100, 441 (1995) CrossRef
Ma, J., Pu, Y.-K., J. Phys. Plasmas 10, 4118 (2003) CrossRef
Hikosaka, Y., Nakamura, M., Sugai, H., Jpn J. Appl. Phys. (Part 1) 33, 2157 (1994) CrossRef
Tian-Ye, N., Jin-Xiang, C., Lei, L., Jin-Ying, L., Yan, W., Liang, W., You, L., Chinese Phys. 16, 2757 (2007) CrossRef
Gordillo-Vazquez, F.J., Camero, M., Gomez-Aleixandre, C., Plasma Sources Sci. Technol. 15, 42 (2006) CrossRef
Massabieaux, B., Plain, A., Ricard, A., Capitelli, M., Gorse, C., J. Phys. B: At. Mol. Phys. 16, 1863 (1983) CrossRef
Sugimoto, I., Nakano, S., Kuwano, H., J. Appl. Phys. 75, 7710 (1994) CrossRef
Czerwiec, T., Greer, F., Graves, D.B., J. Phys. D: Appl. Phys. 38, 4278 (2005) CrossRef
Guerra, V., Sa, P.A., Loureiro, J., Eur. Phys. J. Appl. Phys. 28, 125 (2004) CrossRef
Linss, V., Kupfer, H., Peter, S., Richter, F., J. Phys. D: Appl. Phys. 37, 1935 (2004) CrossRef
Fishburne, E.S., J. Chem. Phys. 47, 58 (1967) CrossRef
Jarmain, W.R., Frazer, P.A., Nicholls, R.W., Astrophys. J. 118, 232 (1953) CrossRef
Wronski, Z., Vacuum 78, 641 (2005) CrossRef
Coburn, J.W., Chen, M., J. Appl. Phys. 51, 3134 (1980) CrossRef
Guerra, V., Tatarova, E., Dias, F.M., Ferreira, C.M., J. Appl. Phys. 91, 2648 (2001) CrossRef
Kim, Y.C., Boudart, M., Langmuir 7, 2999 (1991) CrossRefPubMed
Lefevre, L., Belmonte, T., Michel, H., J. Appl. Phys. 87, 7497 (2000) CrossRef
Wang, Y., Olthoff, J.K., J. Appl. Phys. 85, 6358 (1999) CrossRef
Raju, G.G., IEEE Electr. Insul. Mag. 22, 5 (2006) CrossRef
Fancey, K.S., Vacuum 46, 695 (1995) CrossRef
, P.A., Loureiro, J., J. Phys. D: Appl. Phys. 30, 2320 (1997) CrossRef