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Investigation of structural and optical properties of sputtered Zirconia thin films

Published online by Cambridge University Press:  17 July 2008

F. Rebib*
Affiliation:
Fondazione Bruno Kessler-Centro per la Ricerca Scientifica e Tecnologica, Via Sommarive 18, 38050 Povo (Trento), Italy PROMES-CNRS, Tecnosud-Rambla de la Thermodynamique, 66100 Perpignan Cedex, France
N. Laidani
Affiliation:
Fondazione Bruno Kessler-Centro per la Ricerca Scientifica e Tecnologica, Via Sommarive 18, 38050 Povo (Trento), Italy
G. Gottardi
Affiliation:
Fondazione Bruno Kessler-Centro per la Ricerca Scientifica e Tecnologica, Via Sommarive 18, 38050 Povo (Trento), Italy
V. Micheli
Affiliation:
Fondazione Bruno Kessler-Centro per la Ricerca Scientifica e Tecnologica, Via Sommarive 18, 38050 Povo (Trento), Italy
R. Bartali
Affiliation:
Fondazione Bruno Kessler-Centro per la Ricerca Scientifica e Tecnologica, Via Sommarive 18, 38050 Povo (Trento), Italy
Y. Jestin
Affiliation:
CNR-IFN, Istituto di Fotonica e Nanotecnologie, via Sommarive 14, 38050 Trento, Italy
E. Tomasella
Affiliation:
LMI-CNRS, Université Clermont-Ferrand II, 24 avenue des Landais, 63177 Aubière Cedex, France
M. Ferrari
Affiliation:
CNR-IFN, Istituto di Fotonica e Nanotecnologie, via Sommarive 14, 38050 Trento, Italy
L. Thomas
Affiliation:
PROMES-CNRS, Tecnosud-Rambla de la Thermodynamique, 66100 Perpignan Cedex, France
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Abstract

Zirconium oxide thin films were deposited by sputtering a ZrO2 target under an argon-oxygen gas mixture and different total gas pressures. Their composition, structure and optical constants were characterised by mean of Auger profiles, XRD, XPS, m-line and UV-visible spectroscopies. All the deposits were found to be sub-stoechiometric with O/Zr ratio decreasing from 1.6 to 1.45 when the deposition pressure increased from 0.01 to 0.05 Torr. A SRIM simulation was used to explain this behaviour. The XRD showed a monoclinic phase for all sample with different grain size and residual stress. Finally, the optical constants were determined. The refractive index decreased slightly when the deposition pressure increased whereas the optical gap and the Urbach energy were found to be quite constant whatever the sputtering pressure.

Keywords

Type
Research Article
Copyright
© EDP Sciences, 2008

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