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Stiffness analysis of a compliant precision positioning stage

Published online by Cambridge University Press:  14 November 2011

X. Jia ,
J. Liu ,
Y. Tian  and
D. Zhang
X. Jia
Affiliation:
School of Mechanical Engineering, Tianjin University, Tianjin 300072, China School of Mechanical Engineering, Hebei University of Technology, Tianjin 300130, China
J. Liu
Affiliation:
School of Mechanical Engineering, Hebei University of Technology, Tianjin 300130, China
Y. Tian*
Affiliation:
School of Mechanical Engineering, Tianjin University, Tianjin 300072, China
D. Zhang
Affiliation:
School of Mechanical Engineering, Tianjin University, Tianjin 300072, China
*
*Corresponding author. E-mail: meytian@tju.edu.cn
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Summary

In this paper a 3-degree of freedom compliant parallel positioning stage utilizing flexure hinges is explored for nanoimprint lithography. The performance of the stage is extensively analyzed using a pseudo-rigid body model and finite element method. The position and velocity models are established. Accordingly, the stiffness at driving point of the active arm is obtained on the basis of Castigliano's first theorem. The system stiffness of the compliant stage is explored using the compliant matrix methodology and matrix transformation, and the influence of the geometry parameters on stiffness factors in three directions has been graphically evaluated as well. Finite element analysis has been conducted to verify that the established models faithfully predict device performance.

Keywords

Nanoimprint lithographyCompliant mechanismFinite element analysisStiffness matrix
Type
Articles
Information
Robotica , Volume 30 , Issue 6 , October 2012 , pp. 925 - 939
Copyright
Copyright © Cambridge University Press 2011

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References

1.Guo, L. J., “Recent progress in nanoimprint technology and its applications,” J. Phys. D: Appl. Phys. 37 (2), 123–141 (2004).CrossRefGoogle Scholar
2.Chou, S. Y. and Krauss, P. R., “Imprint lithography with sub-10 nm feature size and high throughput,” Microelectron. Eng. 35 (1–4), 237–240 (1997).CrossRefGoogle Scholar
3.Alkaisi, M. M. et al. , “Multilevel nanoimprint lithography,” Curr. Appl. Phys. 4 (2–4), 111–114 (2004).Google Scholar
4.Schulz, H., Pavlicek, H. and Reng, N., “Step and Flash Nanoimprint Lithography in Europe,” In: Proceedings of the 4th IEEE Conference on Nanotechnology, Munich Germany, (Aug. 16–19, 2004), pp. 655–656.Google Scholar
5.Choi, B. J., Sreenivasan, S. V., Jonhson, S., Colburn, M. and Wilson, C. G., “Design of orientation stage for step and flash imprint lithography,” Precis. Eng. 25 (3), 192–199 (2001).Google Scholar
6.Lee, J. J., Choi, K. B. and Kim, G. H., “Design and analysis of the single-step nanoimprinting lithography equipment for sub-100 nm linewidth,” Curr. Appl. Phys. 6, 1007–1011 (2006).Google Scholar
7.Lee, J. J., Choi, K. B. and Kim, G. H. et al. , “The UV-Nanoimprint Lithography with Multi-Head Nanoimprinting Unit for Sub-50 nm Half-Pitch Patterns,” In: Proceedings of the SICE-ICASE International Joint Conference 2006, Bexco, Busan, Korea (Oct. 18–21, 2006) pp. 4902–4904.CrossRefGoogle Scholar
8.Fan, X. Q., Zhang, H. H. and Hu, X. F., “A nanoimprint lithography prototype with wide working range and high precision alignment,” China Mech. Eng. 16(supplement), 64–67 (2005) (in Chinese).Google Scholar
9.Yan, L., Lu, B. H. and Ding, Y. C. et al. , “High-precision orientation stage for room-temperature imprint lithography,” China Mech. Eng. 15 (1), 75–78 (2004) (in Chinese).Google Scholar
10.Dong, X. W., Si, W. H. and Gu, W. Q., “Design of bellows cylinder type UV nanoimprint lithography system,” Semicond. Optoelectron. 28 (5), 676–684 (2007) (in Chinese).Google Scholar
11.Lan, H. B., Ding, Y. C. and Liu, H. Z. et al. , “Review of the wafer stage for nanoimprint lithography,” Microelectron. Eng. 84, 684–688 (2007) (in Chinese).CrossRefGoogle Scholar
12.Tian, Y., Shirinzadeh, B., Zhang, D. and Alici, G., “Development and dynamic modeling of a flexure-based Scott–Russell mechanism for nano-manipulation,” Mech. Syst. Signal Process. 23 (3), 957–978 (2008).CrossRefGoogle Scholar
13.Zhang, D., Chetwynd, D., Liu, X. and Tian, Y., “Investigation of a 3-DOf micro-positioning table for surface grinding,” Int. J. Mech. Sci. 48 (12), 1401–1408 (2006).Google Scholar
14.Li, Y. and Xu, Q., “A novel design and analysis of a 2-DOF compliant parallel micromanipulator for nanomanipulation,” IEEE Trans. Autom. Sci. Eng. 3 (3), 248–254 (2006).Google Scholar
15.Li, Y. and Xu, Q., “Modeling and performance evaluation of a flexure-based XY parallel micromanipulator,” Mech. Mach. Theory 44 (12), 2127–2152 (2009).Google Scholar
16.Xu, Q., Li, Y. and Xi, N., “Design, fabrication, and visual servo control of an XY parallel micromanipulator with piezo-actuation,” IEEE Trans. Autom. Sci. Eng. 6 (4), 710–719 (2009).Google Scholar
17.Li, Y. and Xu, Q., “Design and analysis of a totally decoupled flexure-based XY parallel micromanipulator,” IEEE Trans. Robot. 25 (3), 645–657 (2009).Google Scholar
18.Tian, Y. and Shirinzadeh, B., “Performance Evaluation of a Flexure-Based Five-Bar Mechanism for Micro/Nano Manipulation,” In: Proceedings of the IEEE/ASME International Conference on Advanced Intelligent Mechatronics, Singapore (Jul. 14–17, 2009) pp. 76–81.Google Scholar
19.Tian, Y., Shirinzadeh, B. and Zhang, D., “Stiffness Estimation of the Flexure-Based Five-Bar Micro-Manipulator,” In: Proceedings of 2008 10th International Conference on Control, Automation, Robotics and Vision, Hanoi, Vietnam (Dec. 17–20, 2008) pp. 599–604.Google Scholar
20.Tian, Y., Shirinzadeh, B. and Zhang, D., “Design and dynamics of a 3-DOF flexure-based parallel mechanism for micro/nano manipulation,” Microelectron. Eng. 87 (2), 230–241 (2010).Google Scholar
21.Handley, D. C., Zhang, W. J., Lu, T. et al. , “Multiple Degree of Freedom Compliant Mechanism Possessing Nearly Uncoupled Dynamics: Expreimental Findings,” In: Proceedings of SPIE, vol. 4936 (2002) pp. 168–176.Google Scholar
22.Zhang, D., Chetwynd, D. G., Liu, X. et al. , “Investigation of a 3-DOF micro-positioning table for surface grinding,” Mech. Sci. 48 (12), 1401–1408 (2006).Google Scholar
23.Ma, L., Rong, W. and Sun, L. N., “A Novel Piezo-Driven Nanopositioning Mechanism for Precise Manipulating,” In: Proceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, Bangkok, Thailand (Jan. 16–19, 2007) pp. 842–846.Google Scholar
24.Kim, H. S. and Cho, Y. M., “Design and modeling of a novel 3-DOF precision micro-stage,” Mechatronics 19 (5), 598–608 (2009).Google Scholar
25.Li, Y. and Xu, Q., “Kinematic Design of a Novel 3-DOF Compliant Parallel Manipulator for Nanomanipulation,” In: Proceedings of the 2005 IEEE/ASME International Conference on Advanced Intelligent Mechatronics, Monterey, CA, USA (Jul. 24–28, 2005) pp. 93–98.Google Scholar
26.Xu, Q. and Li, Y., “Design Modification of a 3-PRC Compliant Parallel Micromanipulator for Micro/Nano Scale Manipulation,” In: Proceedings of the 7th IEEE International Conference on Nanotechnology, Hong Kong, PR China (Aug. 5–10, 2007) pp. 426–431.Google Scholar
27.Xu, Q. and Li, Y., “Design of a Partially Decoupled High Precision XYZ Compliant Parallel Micromanipulator,” In: Proceedings of the 3rd IEEE International Conference on Nano/Micro Engineered and Molecular Systems, Hainan Island, China (Jan. 6–9, 2008) pp. 13–18.Google Scholar
28.Dong, W., Sun, L. N. and Du, Z. J., “Design of a precision compliant parallel positioner driven by dual piezoelectric actuators,” Sensor Actuat. 135 (1), 250–256 (2007).Google Scholar
29.Pham, P., Regamey, Y. J., Fracheboud, M. et al. , “Orion MinAngle: A flexure-based, double-tilting parallel kinematics for ultra-high precision applications requiring high angles of rotation,” Int. Symp. Robot. 36, 1–7 (2005).Google Scholar
30.Sun, L. N., Dong, W. and Du, Z. J., “Stiffness analysis on a wide-range flexure hinge-based parallel manipulator,” Chin. J. Mech. Eng. 41 (8), 90–95 (2005) (in Chinese).Google Scholar
31.Koseki, Y., Tanikawa, T., Koyachi, N. et al. , “Kinematic Analysis of Translational 3-DOF Micro Parallel Mechanism Using Matrix Method,” Proceedings of the IROS, Kagawa, Japan (Oct. 31–Nov. 5, 2000) pp. 786–792.Google Scholar
32.Yu, J. J., Bi, S. S. and Zong, G. H., “Analysis for the static stiffness of a 3-DOF parallel compliant micromanipulatior,” Chin. J. Mech. Eng. 38 (4), 7–10 (2002) (in Chinese).Google Scholar
33.Pham, H. H. and Chen, I. M., “Stiffness modeling of flexure parallel mechanism,” Precis. Eng. 29, 467–478 (2005).Google Scholar
34.Xu, Q. S. and Li, Y. M., “Stiffness Modeling for an Orthogonal 3-PUU Compliant Parallel Micromanipulator,” In: Proceedings of the 2006 IEEE International Conference on Mechatronics and Automation, Luoyang, China (Jun. 25–28, 2006) pp. 124–129.Google Scholar
35.Dong, W., Sun, L. N. and Du, Z. J., “Stiffness research on a high-precision, large-workspace parallel mechanism with compliant joints,” Precis. Eng. 32, 222–231 (2008).Google Scholar
36.Jung, H. K., Crane, C. D. III and Roberts, R. G., “Stiffness mapping of compliant parallel mechanisms in a serial arrangement,” Mech. Mach. Theory 43 (3), 271–284 (2008).Google Scholar
37.Paros, J. M. and Weisbord, L., “How to design flexure hinges,” Mach. Des. 37, 151–157 (1965).Google Scholar
38.Smith, S. T., Badami, V. G., Dale, J. S. et al. , “Elliptical flexure hinges,” Rev. Sci. Instrum. 68 (3), 1474–1483 (1997).Google Scholar
39.Nicolae, L., Ephrahim, G., Mihail, H. et al. , “Stiffness characterization of corner-filleted flexure hinges,” Rev. Sci. Instrum. 75 (11), 4896–4905 (2004).Google Scholar
40.Nicolae, L., Jeffrey, S. N. P., Ephrahim, G. et al. , “Corner-filleted flexure hinges,” J. Mech. Des. 123 (3), 346–352 (2001).Google Scholar
41.Tian, Y., Shirinzadeh, B., Zhang, D. et al. , “Three flexure hinges for compliant mechanism designs based on dimensionless graph analysis,” Precis. Eng. 34 (1), 92–100 (2010).Google Scholar
42.Yang, Q. Z., Yin, X. Q., Ma, L. Z. et al. , “Establishing stiffness of prismatic pair in fully compliant parallel micro-robot using energy method,” J. Jiangsu Univ. (Natural Science Ed.) 26 (1), 12–15 (2005) (in Chinese).Google Scholar
43.Tian, Y., Shirinzadeh, B. and Zhang, D., “A flexure-based mechanism and control methodology for ultra-precision turning operation,” Precis. Eng. 33 (2), 160–166 (2009).Google Scholar
44.Tsai, L. and Stamper, R., “A Parallel Manipulator with only Translational Degrees of Freedom,” Proceedings of the 1996 ASME Design Engineering Technical Conference, MECH: 1152, Irvine, CA, USA (Aug. 18–20, 1996).Google Scholar
45.Tian, Y., Shirinzadeh, B., Zhang, D. and Liu, X., “Design and forward kinematics of the compliant micro-manipulator with lever mechanisms,” Precis. Eng. 33 (4), 466–475 (2009).Google Scholar
46.Staicu, S., “Inverse dynamics of the 3-PRR planar parallel robot,” Robot. Auton. Syst. 57, 556–563 (2009).Google Scholar
47.Staicu, S., “Dynamics of the spherical 3-UPS/S parallel mechanism with prismatic actuators,” Multibody Syst. Dyn. 32 (2), 115–132 (2009).CrossRefGoogle Scholar
48.Staicu, S. and Zhang, D., “A novel dynamic modeling approach for parallel mechanisms analysis,” Robot. Comput.-Integr. Manuf. 24, 167–172 (2008).Google Scholar
49.Staicu, S., “Recursive modelling in dynamics of Delta parallel robot,” Robotica 27, 199–207 (2009).Google Scholar