Research Article
Poly-Si - A Most Important Material
- Published online by Cambridge University Press: 21 February 2011, 3
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Interface Oxide Free Poly Silicon Deposition Using in-Situ HF Cleaning Process
- Published online by Cambridge University Press: 21 February 2011, 9
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In-Situ Doped Polycrystalline Silicon Deposited by Rapid Thermal Chemical Vapor Deposition Using Tertiarybutylphosphine
- Published online by Cambridge University Press: 21 February 2011, 15
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Rapid Thermal Chemical Vapor Deposition of Polycrystalline Silicon From Dichlorosilane
- Published online by Cambridge University Press: 21 February 2011, 21
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Electrical and Structural Characterization of Polysilicon Deposited in a Rapid Thermal Processor*
- Published online by Cambridge University Press: 21 February 2011, 29
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Large-Grain Polysloon Films Depied by Raped Thermal IPCVD
- Published online by Cambridge University Press: 21 February 2011, 35
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Properties of in Situ Doped Polycrystalline Silicon Films Deposited from Phosphine and Disilane
- Published online by Cambridge University Press: 21 February 2011, 43
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Crystal Growth Study of Silicon and Germanium Wafers Used for Photovoltaic Devices
- Published online by Cambridge University Press: 21 February 2011, 49
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Thermal Stability of CoSi2 on Single Crystal and Polycrystalline Silicon
- Published online by Cambridge University Press: 21 February 2011, 57
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TiSi2 Thin Films Formed on Crystalline and Amorphous Silicon
- Published online by Cambridge University Press: 21 February 2011, 65
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Geometrical Effects and Disintegration of Narrow TiSi2/Poly-Si Lines
- Published online by Cambridge University Press: 21 February 2011, 71
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The Effect of Amorphous Silicon Layer in PE-CVD Titanium Polycide Gate Dielectrics
- Published online by Cambridge University Press: 21 February 2011, 77
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Cobalt Silicide Formation on Polysilicon: Dopant Effects on Reaction Kinetics and Silicide Properties
- Published online by Cambridge University Press: 21 February 2011, 83
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Microanalysis of Tungsten Silicide/Polysilicon Interface: Effectiveness of in Situ Rie Clean on Removal of Native Oxide
- Published online by Cambridge University Press: 21 February 2011, 89
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Rapid Thermal Annealed TIW/TI Contact Metallization for Advanced VLSI Si Circuits
- Published online by Cambridge University Press: 21 February 2011, 97
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Crystallization of Silicon Ion Implanted LPCVD Amorphous Silicon Films for High Performance Poly-TFT
- Published online by Cambridge University Press: 21 February 2011, 107
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Dopant Enhanced Grain Growth During Crystallization of Amorphous Silicon Using Rapid Thermal Anealing
- Published online by Cambridge University Press: 21 February 2011, 115
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Nanosecond Thermal Processing of Polysilicon thin Films
- Published online by Cambridge University Press: 21 February 2011, 121
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Modelling Diffusion in and From Polysilicon Layers
- Published online by Cambridge University Press: 21 February 2011, 129
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Diffusion of as and B in Polysilicon/ Single Crystal Silicon Systems
- Published online by Cambridge University Press: 21 February 2011, 141
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