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X-Ray Reflectometry of Single- and Multi-Layer Thin Films

Published online by Cambridge University Press:  21 February 2011

W. Parrish ,
C. Erickson ,
T. C. Huang ,
M. Hart ,
B. Gilles  and
H. Toraya
W. Parrish
Affiliation:
IBM Research Division, Almaden Research Center, San Jose, California, 95120-6099
C. Erickson
Affiliation:
IBM Research Division, Almaden Research Center, San Jose, California, 95120-6099
T. C. Huang
Affiliation:
IBM Research Division, Almaden Research Center, San Jose, California, 95120-6099
M. Hart
Affiliation:
Departmcnt of Physics, The University, Manchester M 13 9PL, U.K
B. Gilles
Affiliation:
C.E.N.G. 85X, 38041 Grenoble Cedex, France
H. Toraya
Affiliation:
Ceramics Research Laboratory, Nagoya Institute of Technology, Tajimi, Gifu, Japan
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Abstract

This paper describes the instrumentation and technique for the routine characterization of thin Films, multi-layers and substrates by grazing incidence X-ray reflectometry with a rotating anode and CuKα1, line source. Ge 220 channel monochromators with two reflections per channel were used with one CM placed before and the other after the specimen. In many applications the second CM could be replaced with a narrow receiving slit. The specimen holder was designed to make fine translations of the specimen for alignment, a base was designed to permit precise positioning of the diffractometer, and a high-speed Rigaku scintillation counter was used. The alignment and calibration are described and some typical data given to illustrate the capability of the method.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 208: Symposium J – Advances in Surface and Thin Film Diffraction , 1990 , 327
Copyright
Copyright © Materials Research Society 1991

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References

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