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X-Ray Diffraction and Reflectometry Investigation of Interdiffusion In Sputtered Niobium-Tungsten Bilayers

Published online by Cambridge University Press:  10 February 2011

U. Welzel ,
P. Lamparter  and
E. J. Mittemeijer
U. Welzel
Affiliation:
Max Planck Institute for Metals Research, SeestraBe 92, 70174 Stuttgart, Germany
P. Lamparter
Affiliation:
Max Planck Institute for Metals Research, SeestraBe 92, 70174 Stuttgart, Germany
E. J. Mittemeijer
Affiliation:
Max Planck Institute for Metals Research, SeestraBe 92, 70174 Stuttgart, Germany
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Abstract

Interdiffusion in sputtered niobium(45nm)-tungsten(45nm) bilayers upon annealing at low temperatures (T<1000K) has been investigated using X-ray reflectometry and diffraction. The accompanying changes in macrostress and microstructure have been characterized by applying the X-ray diffraction sin2ψ T method and by qualitative evaluation of the diffraction line broadening, respectively. Annealing causes, besides interdiffusion, changes of macrostress and decrease of microstructural imperfection. Concentration profiles corresponding to diffusion lengths of only a few nanometers were determined by simulation of the measured reflectivity patterns. The values obtained for the diffusion coefficients are compared with corresponding values obtained by extrapolation from published data for bulk materials at much higher temperatures.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 562: Symposium L – Polycrystalline Metal & Magnetic Thin Films , 1999 , 147
Copyright
Copyright © Materials Research Society 1999

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References

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