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The Use of Xanthates as Precursors for the Deposition of Nickel Sulfide Thin Films by Aerosol Assisted Chemical Vapour Deposition

Published online by Cambridge University Press:  15 February 2011

P.L. Musetha ,
N. Revaprasadu ,
M.A Malik  and
P. O'Brien
P.L. Musetha
Affiliation:
Department of Chemistry, University of Zululand, Private Bag X 1001, KwaDlangezwa,3886, South Africa.
N. Revaprasadu
Affiliation:
Department of Chemistry, University of Zululand, Private Bag X 1001, KwaDlangezwa,3886, South Africa.
M.A Malik
Affiliation:
The School of Chemistry, University of Manchester, Oxford Road, Manchester, M13 9PL. E-mail – nrevapra@pan.uzulu.ac.za
P. O'Brien
Affiliation:
The School of Chemistry, University of Manchester, Oxford Road, Manchester, M13 9PL. E-mail – nrevapra@pan.uzulu.ac.za
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Abstract

Nickel sulphide (NiS) thin films have been deposited on glass by aerosol assisted chemical vapour deposition(AACVD) using single source precursors of the type, ([Ni(S2COR2)2], R = C2H5 or C3H7). TGA analyses showed that the precursors are highly volatile, making them suitable for AACVD studies. As deposited NiS films were polycrystalline as confirmed by XRD. The films have been characterised by xray diffraction (XRD), scanning electron microscopy (SEM), and Energy dispersive analysis of x-rays (EDAX).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 879: Symposium Z – Chemistry of Nanomaterial Synthesis and Processing , 2005 , Z7.4
Copyright
Copyright © Materials Research Society 2005

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