Hostname: page-component-848d4c4894-2pzkn Total loading time: 0 Render date: 2024-04-30T21:05:19.822Z Has data issue: false hasContentIssue false
  • English
  • Français

Two-Photon Absorption Cross Section for Silane Under Pulsed Arf (193 nm) Excimer Laser Irradiation

Published online by Cambridge University Press:  26 February 2011

C. Fuchs ,
E. Boch ,
E. Fogarassy ,
B. Aka  and
P. Siffert
C. Fuchs
Affiliation:
Centre De Recherches Nucleaires (In2p3), Laboratoire Phase (Ua Du Cnrs N*292), 23 Rue Du Loess, F-67037 Strasbourg Cedex (France)
E. Boch
Affiliation:
Centre De Recherches Nucleaires (In2p3), Laboratoire Phase (Ua Du Cnrs N*292), 23 Rue Du Loess, F-67037 Strasbourg Cedex (France)
E. Fogarassy
Affiliation:
Centre De Recherches Nucleaires (In2p3), Laboratoire Phase (Ua Du Cnrs N*292), 23 Rue Du Loess, F-67037 Strasbourg Cedex (France)
B. Aka
Affiliation:
Centre De Recherches Nucleaires (In2p3), Laboratoire Phase (Ua Du Cnrs N*292), 23 Rue Du Loess, F-67037 Strasbourg Cedex (France)
P. Siffert
Affiliation:
Centre De Recherches Nucleaires (In2p3), Laboratoire Phase (Ua Du Cnrs N*292), 23 Rue Du Loess, F-67037 Strasbourg Cedex (France)
Get access

Abstract

We have determined for the first time, the two-photon absorption cross-section of silane at 193 nm, by measuring directly the fraction of incident light absorbed in the gas phase during the irradiation with a pulsed ArF excimer laser.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 101: Symposium B – Laser and Particle-Beam Chemical Processing for Microelectronics , 1987 , 361
Copyright
Copyright © Materials Research Society 1998

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1 Andreatta, R. W., Abele, C.C., Osmunden, J.F., Eden, J.G., Lubben, D., Greene, J.E., Appl. Phys. Lett. 40(2), 183(1982).Google Scholar
2 liurahara, M., Toyoda, K., In Laser Processing and Diagnostics, Chemical Physics 39, edited by D. Bauerle, (Springer Verlag, Berlin, Heidelberg, New York, Tokyo, 1984), p. 252.Google Scholar
3 Yoshikawa, A., Yamaga, S., Jpn. J. Appl. Phys. 23 L91 (1984).Google Scholar
4 Yamada, A., Konogai, M., Takahashi, K., Jpn. J. Appl. Phys. 24 1586 (1985).Google Scholar
5 Toyoshima, Y., Kumata, K., Itoh, U., Matsuda, A., Appl. Phys. Lett. 32 (1), 1925, (1978.Google Scholar
6 Itoh, U., Toyoshima, Y., Onuki, H., Washida, N., Ibuki, T., J. Chem. Phys. 85(9), 4867(1986).Google Scholar
7 Fuchs, C., Fogarassy, E., In Photon, Beam and Plasma Stimulated Chemical Processes at Surfaces, edited by Donnelly, V.M., Herman, I.P., Hirose, M., (Mater. Res. Soc. 75, Pittsburg, PA, 1987) p. 195.Google Scholar
8 Clark, J.H., Anderson, R.G., Appl. Phys. Lett. 32 (1), 46 (1978).Google Scholar
9 Mosatelli, F.A., Am. J. Phys. 54 (1), 52 (1986).Google Scholar