Hostname: page-component-848d4c4894-tn8tq Total loading time: 0 Render date: 2024-06-17T12:20:53.317Z Has data issue: false hasContentIssue false
  • English
  • Français

Titanium Nitride Thin Films: Properties and Apcvd Synthesis Using Organometallic Precursors

Published online by Cambridge University Press:  21 February 2011

Renaud M. Fix ,
Roy G. Gordon  and
David M. Hoffman
Renaud M. Fix
Affiliation:
Harvard University, Department of Chemistry, 12 Oxford Street, Cambridge, MA 02138
Roy G. Gordon
Affiliation:
Harvard University, Department of Chemistry, 12 Oxford Street, Cambridge, MA 02138
David M. Hoffman
Affiliation:
Harvard University, Department of Chemistry, 12 Oxford Street, Cambridge, MA 02138
Get access

Abstract

A novel process for the low temperature synthesis of titanium nitride thin films by APCVD is described. TiN coatings containing less than one atom percent of carbon and oxygen were deposited at 200 °C on silicon, vitreous carbon, glass, stainless steel and plastic substrates using Ti(Nme2)4 and ammonia gas as precursors. The films were characterized by Rutherford backscattering spectrometry and X-ray photoelectron spectroscopy.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 168 , 1989 , 357
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1.Refractory Materials, edited by Margrave, J. L. (Academic Press, New York, 1971).Google Scholar
2.Schintlmeister, W., Pacher, O., Pfaffinger, K., J. Electrochem. Soc. 123, 924 (1976).Google Scholar
3.Kurtz, S. R., Gordon, R. G., Thin Solid Films 140, 277 (1986).Google Scholar
4.Bradley, D. C., Thomas, I. M., J. Chem. Soc. 1960, 3857.Google Scholar
5.Seyferth, D., Mignani, G., J. Mater. Sci. Lett. 7, 487 (1988).Google Scholar
6.Fix, R. M., Gordon, R. G., Hoffman, D. M., submitted for publication.Google Scholar
7.Lee, L. L. Jr., Schiffer, J. P., Phys. Rev. 115, 160 (1959).Google Scholar
8. TiN: Index No. 38–1420. Powder Diffraction File, editor in chief: W. F. McClune (JCPDS International Centre for Diffraction Data, Swarthmore, PA 19081–2389, USA).Google Scholar
9.Wagner, C. D. et al., Handbook of X-Ray Photoelectron Spectroscopy (Perkin-Elmer Corporation, Eden Prairie).Google Scholar
10.Bradley, D. C., Torrible, E. G., Can. J. Chem. 41, 134 (1963).Google Scholar
11.Nugent, W. A., Ovenall, D. W., Holmes, S. J., Organometallics 2, 161 (1983).Google Scholar
12.Takahashi, Y., Onoyama, N., Ishikawa, Y., Motojima, S., Sugiyama, K., Chem. Lett. 1978, 525.Google Scholar
13.Ahmed, K. J., Chisholm, M. H., Folting, K., Huffman, J. C., J. Am. Chem. Soc. 108, 989 (1986).Google Scholar
14.Bürger, H., Neese, H.-J., J. Organomet. Chem. 21, 381 (1970).Google Scholar