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Thin Film Growth and Ion-Beam Modification: Md Simulations Going Beyond Simple Systems

Published online by Cambridge University Press:  10 February 2011

Edwin F. C. Haddeman ,
Bouke S. Bunnik  and
Barend J. Thijsse
Edwin F. C. Haddeman
Affiliation:
Delft University of Technology, Dept. of Materials Science, Center for Research on Ion-Solid Interactions and Surfaces (CRISIS), Delft, Netherlands, B.J.Thijsse@tnw.tudelft.nl
Bouke S. Bunnik
Affiliation:
Delft University of Technology, Dept. of Materials Science, Center for Research on Ion-Solid Interactions and Surfaces (CRISIS), Delft, Netherlands, B.J.Thijsse@tnw.tudelft.nl
Barend J. Thijsse
Affiliation:
Delft University of Technology, Dept. of Materials Science, Center for Research on Ion-Solid Interactions and Surfaces (CRISIS), Delft, Netherlands, B.J.Thijsse@tnw.tudelft.nl
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Abstract

Molecular Dynamics computer simulations were used to explore a number of complex phenomena that occur during film growth and ion-surface interactions. A few examples are discussed. (1) Strong surface patterns develop when a Mo film is grown on a Mo(110) substrate, whereas they are absent for Mo on Mo(100). (2) Depositing a Mo film on a substrate containing two antiparallel (100)/(910) grain boundaries leads to complicated film morphologies in the grain boundary regions. Stresses, mosaic spread, and regions of fcc Mo are observed, and their stability is examined. (3) Cu films deposited on a Mo(110) substrate, a model system for interconnects in modern IC technology, are affected by the strong fcc/bcc interface mismatch. The Cu film properties are analyzed for thermally evaporated films and for films grown by argon ion-beam assisted deposition (IBAD).

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 585: Symposium L – Fundamental Mechanisms of Low-Energy-Beam Modified Surface , 1999 , 103
Copyright
Copyright © Materials Research Society 2000

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