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Thin Film Fuel Cells

Published online by Cambridge University Press:  16 February 2011

V.E.J. Van Dieten ,
J.P. Dekker  and
J. Schoonman
V.E.J. Van Dieten
Affiliation:
Laboratory for Applied Inorganic Chemistry, Delft University of Technology, Julianalaan 136, 2628 BL Delft, The Netherlands
J.P. Dekker
Affiliation:
Laboratory for Applied Inorganic Chemistry, Delft University of Technology, Julianalaan 136, 2628 BL Delft, The Netherlands
J. Schoonman
Affiliation:
Laboratory for Applied Inorganic Chemistry, Delft University of Technology, Julianalaan 136, 2628 BL Delft, The Netherlands
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Abstract

In recent years there has been an enormous increase in the application of thin film technologies in the fabrication of solid state electrochemical devices. Devices in which thin film components are utilized are, e.g. solid oxide fuel cells (SOFCs), thin film rechargeable batteries, and chemical gas sensors. Chemical vapour deposition (CVD) is one of the synthesis techniques for the fabrication of thin film components for solid state electrochemical devices. This paper will focus on the application of novel CVD techniques for the fabrication of the thin film components of one of these devices, i.e. the solid oxide fuel cell. A new SOFC design concept which uses only one gas phase synthesis method will be presented.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 369: Symposium U – Solid State Ionics IV , 1994 , 669
Copyright
Copyright © Materials Research Society 1995

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References

references

1. Hammou, A., Advances in Electrochemical Science and Engineering, 2, 87 (1992).Google Scholar
2. Kinoshita, K., Larnon, F.R. Mc., and Cairns, E.J., DOE Report DOE/METC-88/6096 (U.S. Department of Energy-METC, Morgantown, 1988), p. 87.Google Scholar
3. Minh, N.Q., J. Am. Ceram. Soc., 76, 563 (1993).Google Scholar
4. Dekker, J.P., Ph.D. Thesis, Delft University of Technology, Delft, 1994, Ch. 8.Google Scholar
5. Singhal, S.C., in Proc. 2nd Int. Symp. on SOFCs, edited by Grosz, F., Zegers, P., Singhal, S.C., and Yamamoto, O. (CEC, Luxembourg, 1991), p. 25.Google Scholar
6. Isenberg, A-O., in Proc. Symp. Electrode Materials and Processes for Energy Conversion and Storage, edited by Intyre, J.D.E. Mc., Srinivasan, S., and Will, F.G. (The Electrochemical Society, Pennington, NJ, 1977), p. 572.Google Scholar
7. Pal, U.B. and Singhal, S.C., J. Electrochem. Soc., 137, 2937 (1990).Google Scholar
8. Dekker, J.P., Put, P.J. van der, Veringa, H.J., and Schoonman, J., J. Am. Ceram. Soc., submitted (1994).Google Scholar
9. Dekker, J.P., Put, P.J. van der, Veringa, H.J., and Schoonman, J., Aerosol Sci. and Technol., 19, 549 (1993).Google Scholar
10. Galasso, F.S., Chemical Vapour Deposited Materials (CRC Press Inc., Boca Raton, FL, 1992).Google Scholar
11. Spear, K.E., Pure Appl. Chem., 54, 1297 (1982).Google Scholar
12. Brekel, C.H.J. van den, Philips Res. Repts., 32, 118 (1977).Google Scholar
13. Brekel, C.H.J. van den and Bloem, J., Philips Res. Repts., 32, 134 (1977).Google Scholar
14. Carolan, M.F. and Michaels, J.N., Solid State Ionics, 37, 189 (1990).Google Scholar
15. Dekker, J.P., Kiwiet, N.J., and Schoonman, J., in Solid Oxide Fuel Cells, edited by Singhal, S.C. (The Electrochemical Society, Pennington, NJ, 1989), p. 57.Google Scholar
16. Kiwiet, N.J. and Schoonman, J., in Proc. 25th Int. Soc. Energy Cony. Eng. Conf., edited by Nelson, P.A. et al. (AIChE, Vol. 3, New York, NY, 1990), p. 240.Google Scholar
17. Schoonman, J., Dekker, J.P., Broers, J.W., and Kiwiet, N.J., Solid State Ionics, 46, 299 (1991).Google Scholar
18. Lin, Y.S., Haart, L.G.J. de, Vries, K.J. de, and Burggraaf, A.J., J. Electrochem. Soc., 137, 3960 (1990).Google Scholar
19. Lin, Y.S., Ph.D. Thesis, University of Twente, Enschede, 1991, Ch. 6.Google Scholar
20. Komiyama, H., Osawa, T., Shimogaki, Y., Wakita, N., Mianamiyama, M., and Ueoka, T., in Proc. 10th Int. Conf. Chemical Vapor Deposition, edited by Cullen, G.W. and Blocher, J.M. Jr. (Vol. 87-7, The Electrochemical Society, Pennington, NJ, 1987), p. 1119.Google Scholar
21. Dekker, J.P., Put, P.J. van der, Veringa, H.J. and Schoonman, J., in Ceramics Adding the Value, AUSTCERAM 92, edited by Bannister, M.J. (Vol. 1, CSIRO Publications, Melbourne, 1992), p. 787.Google Scholar
22. Wagner, C., Z. Physik. Chem., B21, 25 (1933).Google Scholar
23. Kofstad, P., High Temperature Corrosion (Elsevier Applied Sciense Publishers LTD, Amsterdam, 1988), Ch. 6.Google Scholar
24. Buckley, J.D., Am. Ceram. Soc. Bull., 67, 364 (1988).Google Scholar
25. Fitzer, E. and Gadow, R., Am. Ceram. Soc. Bull., 65, 326 (1986).Google Scholar
26. Rossignol, J.Y., Quenisset, J.M., and Naslain, R., Composites, 18, 135 (1987).Google Scholar
27. Reagan, P., Ross, M.F., and Huffman, F.N., Adv. Ceram. Mater., 3, 198 (1988).Google Scholar
28. Veltri, R.D., Condit, D.A., and Galasso, F.S., J. Am. Ceram. Soc., 72, 478 (1989).Google Scholar
29. Fitzer, E., Remmele, W., and Schoch, G., in J. de Physique, Coll. C5, (suppl. J. de Physique II, 1989), C5–209.Google Scholar
30. Caputo, A.J. and Lackey, W.J., Ceram. Eng. Sci. Proc., 5, 654 (1984).Google Scholar
31. Gulden, T.D., Kaae, J.L., and Norton, K.P., in Proc. 11th Int. Conf. Chemical Vapor Deposition, edited by Spear, K.E. and Cullen, G.W. (Vol. 90-12, The Electrochemical Society, Pennington, NJ, 1990), p. 546.Google Scholar
32. Fitzer, E., in J. de Physique IV, Coll. C2 (suppl. J. de Physique II, 1991), Vol. 1, C2–509.Google Scholar
33. Lin, Y.S. and Burggraaf, A.J., Chem. Eng. Sci., 46, 3067 (1991).Google Scholar
34. Shiroyama, M., Japanese Patent, JP 61-207282, (1986).Google Scholar
35. Dekker, J.P., Put, P.J. van der, Veringa, H.J., and Schoonman, J., in Proc. Int. Ceram. Conf., AUSTCERAM 92, edited by Bannister, M.J. (Vol. 2, CSIRO Publications, Melbourne, 1992), p. 712.Google Scholar
36. Izaka, M. and Komiyama, H., in Proc. 11th Int. Conf. Chemical Vapor Deposition, edited by Spear, K.E. and Cullen, G.W. (Vol. 90-12, The Electrochemical Society, Pennington, NJ, 1990), p. 596.Google Scholar
37. Brekel, C.H.J. van den, Fonville, R.M.M., Straten, P.J.M. van der, and Verspui, G., in Proc. 8th Int. Conf. Chemical Vapor Deposition, edited by Blocher, J.M. Jr. et al. (Vol. 81-7, The Electrochemical Society, Pennington, NJ, 1980), p. 142.Google Scholar
38. Tai, N.H. and Chou, T.W., Mat. Res. Soc. Symp. Proc., 120, 185 (1988).Google Scholar
39. Tai, N.H. and Chou, T.W., J. Am. Ceram. Soc., 73, 414 (1989).Google Scholar
40. Lin, Y.S., in Proc. 11th Int. Conf. Chemical Vapor Deposition, edited by Spear, K.E. and Cullen, G.W. (Vol. 90-12, The Electrochemical Society, Pennington, NJ, 1990), p. 532.Google Scholar
41. Gupte, S.M. and Tsamopoulos, J.A., J. Electrochem. Soc., 136, 555 (1989).Google Scholar
42. Moene, R., Dekker, J.P., Makkee, M., Schoonman, J., and Moulijn, J.A., J. Electrochem. Soc., 141, 282 (1994).Google Scholar
43. Fedou, R., Langlais, F., and Naslain, R., in Proc. 11th Int. Conf. Chemical Vapor Deposition, edited by Spear, K.E. and Cullen, G.W. (Vol. 90-12, The Electrochemical Society, Pennington, NJ, 1990), p. 513.Google Scholar
44. Dekker, J.P., Put, P.J. van der, Veringa, H.J., and Schoonman, J., J. Electrochem. Soc., 141, 787 (1994).Google Scholar
45. Shimogaki, Y. and Komiyama, H., in New Materials Processing, World Congress III of Chemical Engineering (Tokyo, Japan, 1986), p. 258.Google Scholar
46. Komiyama, H., European Patent, EP 0186 910 Al (1985).Google Scholar
47. Osawa, T. and Komiyama, H., in New Materials Processing, World Congress III of Chemical Engineering (Tokyo, Japan, 1986), p. 250.Google Scholar
48. Komiyama, H. and Osawa, T., Jpn. J. Appl. Phys., 24, L795 (1985).Google Scholar
49. Funk, R., Schachner, H., Triquet, C., Kornmann, M., and Lux, B., in Proc. 5th Int. Conf. Chemical Vapor Deposition, edited by Blocher, J.M. Jr. (Vol. 75-2, The Electrochemical Society, Princeton, NJ, 1975), p.469.Google Scholar
50. Sipp, E., Langlais, F., and Naslain, R., J. of Alloys and Compounds, 186, 65 (1992); 186, 77 (1992).Google Scholar
51. Dieten, V.E.J. van, Dekker, J.P., Hurkmans, E.J., and Schoonman, J., Aerosol Sci. and Technol., 19, 562 (1993).Google Scholar
52. Carini, G.F. II, Anderson, H.U., Sparlin, D.M., and Nasrallah, M.M., Solid State Ionics, 49, 233 (1991).Google Scholar
53. Pierson, H.O., Handbook of Chemical Vapor Deposition (CVD) (Noyes Publications, Park Ridge, NJ, 1992).Google Scholar