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Thermal Stability of Nanocrystalline Diamond Films Grown by Microwave Plasma Chemical Vapor Deposition

Published online by Cambridge University Press:  11 February 2011

Mevlut Bulut ,
Shane A. Catledge ,
Yogesh K. Vohra  and
Renato P. Camata
Mevlut Bulut
Affiliation:
Department of Physics, University of Alabama at Birmingham, Birmingham, AL 35294–1170, U.S.A.
Shane A. Catledge
Affiliation:
Department of Physics, University of Alabama at Birmingham, Birmingham, AL 35294–1170, U.S.A.
Yogesh K. Vohra
Affiliation:
Department of Physics, University of Alabama at Birmingham, Birmingham, AL 35294–1170, U.S.A.
Renato P. Camata
Affiliation:
Department of Physics, University of Alabama at Birmingham, Birmingham, AL 35294–1170, U.S.A.
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Abstract

In this work, the open-air thermal stability of nanocrystalline diamond films grown on mirror-polished titanium alloy substrates by the Microwave Plasma Chemical Vapor Deposition (MPCVD) technique was studied. The results of this investigation show that nanocrystalline diamond films are highly stable in air up to 600°C with no significant change in mechanical properties. Samples annealed between 600°C and 650°C, however, exhibit values of hardness lower by as much as 40% compared to as-grown samples. Above 650°C serious delamination effects were observed in the coatings.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 750: Symposium Y – Surface Engineering 2002–Synthesis, Characterization and Applications , 2002 , Y2.9
Copyright
Copyright © Materials Research Society 2003

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References

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