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Synthetic Control and Properties of Processible Poly(Methylsilsesquioxane)S

Published online by Cambridge University Press:  17 March 2011

Jin-Kyu Lee ,
Kookheon Char ,
Hie-Joon Kim ,
Hee-Woo Rhee ,
Hyun-Wook Ro ,
Dae Young Yoo  and
Do Y. Yoon
Jin-Kyu Lee
Affiliation:
School of Chemistry and Molecular Engineering and School of Chemical Engineering, Seoul National University, Seoul 151-742, Korea
Kookheon Char
Affiliation:
School of Chemical Engineering, Seoul National University, Seoul 151-742, Korea
Hie-Joon Kim
Affiliation:
School of Chemistry and Molecular Engineering and School of Chemical Engineering, Seoul National University, Seoul 151-742, Korea
Hee-Woo Rhee
Affiliation:
Department of Chemical Engineering, Sogang University, Seoul 121-742, Korea
Hyun-Wook Ro
Affiliation:
School of Chemistry and Molecular Engineering and School of Chemical Engineering, Seoul National University, Seoul 151-742, Korea
Dae Young Yoo
Affiliation:
School of Chemistry and Molecular Engineering and School of Chemical Engineering, Seoul National University, Seoul 151-742, Korea
Do Y. Yoon
Affiliation:
School of Chemistry and Molecular Engineering and School of Chemical Engineering, Seoul National University, Seoul 151-742, Korea
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Abstract

Processible poly(methylsilsesquioxane)s (PMSSQs) were prepared in THF solution under nitrogen atmosphere in the presence of HCl catalyst. It was found that various reaction parameters such as concentration, temperature, reaction time, the amount of water, and the amount of acid catalyst could affect the molecular weight and the amount of functional end groups of PMSSQ samples. Thin films prepared from our PMSSQ samples by spin-coating followed by curing to 420°C exhibited a much better crack resistance than those presented in the literature, while the dielectric constant remained practically the same, i.e., ca. 2.7.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 612: Symposium D – Materials, Technology & Reliability for Advanced Interconnects.. , 2000 , D3.6.1
Copyright
Copyright © Materials Research Society 2000

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