Hostname: page-component-77c89778f8-9q27g Total loading time: 0 Render date: 2024-07-18T20:13:35.508Z Has data issue: false hasContentIssue false
  • English
  • Français

Substrate Dependence of Surface Plasmon Resonance Frequency of Silver Island Films

Published online by Cambridge University Press:  11 February 2011

Gang Xu ,
Masato Tazawa  and
Ping Jin
Gang Xu
Affiliation:
National Institute of Advanced Industrial Science and Technology, 2266–98 Shidami, Moriyama-ku, Nagoya 463–8560, Japan
Masato Tazawa
Affiliation:
National Institute of Advanced Industrial Science and Technology, 2266–98 Shidami, Moriyama-ku, Nagoya 463–8560, Japan
Ping Jin
Affiliation:
National Institute of Advanced Industrial Science and Technology, 2266–98 Shidami, Moriyama-ku, Nagoya 463–8560, Japan
Get access

Abstract

A simple method was demonstrated to tune surface plasmon resonance wavelength of silver island films by introducing an underlayer. The tunability can be much enhanced by varying the underlayer medium. In combination with the size effects of metallic islands the plasmon wavelength can be readily adjusted throughout the visible spectral regions. The experimental results were interpreted based on a generalized Maxwell-Garnett theory.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 738: Symposium G – Spatially Resolved Characterization of Local Phenomena in Materials and Nanostructures , 2002 , G13.5
Copyright
Copyright © Materials Research Society 2003

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Craighead, H. G. and Niklasson, G. A., Appl. Phys. Lett. 44, 1134 (1984).Google Scholar
2. Elghanian, R., Storhoff, J. J., Mucic, R. C., Letsinger, R. L., and Mirkin, C. A., Science 277, 1078 (1997).Google Scholar
3. Nie, S., and Emory, S. R., Science 275, 1102 (1997).Google Scholar
4. Xu, H., Bjerneld, E. J., Käll, M., and Börjesson, L., Phys. Rew. Lett. 83, 4357 (1999).Google Scholar
5. Jensen, T. R., Duval, M. L., Kelly, K. L., Lazarides, A. A., Schatz, G. C., and Van Duyne, R. P., J. Phys. Chem. B 103, 9846 (1999).Google Scholar
6. Weimer, W. A. and Dyer, M. J., Appl. Phys. Lett. 79, 3164 (2001).Google Scholar
7. Baba, K., Okuno, T., and Miyagi, M., Appl. Phys. Lett. 62, 437 (1993).Google Scholar
8. Granqvist, C. G. and Hunderi, O., Phys. Rev. B 16, 3513 (1977).Google Scholar
9. Johnson, P. B. and Christy, R., Phys. Rev. B 6, 4370 (1972).Google Scholar