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Study of In‐Situ Laser‐Deposition of Superconducting Thin Films by In‐Situ Resistance Measurement

Published online by Cambridge University Press:  28 February 2011

Q.Y. Ying ,
H.S. Kim ,
D.T. Shaw  and
H.S. Kwok
Q.Y. Ying
Affiliation:
State University of New York at Buffalo, Institute on Superconductivity, Amherst, NY. 14260
H.S. Kim
Affiliation:
State University of New York at Buffalo, Institute on Superconductivity, Amherst, NY. 14260
D.T. Shaw
Affiliation:
State University of New York at Buffalo, Institute on Superconductivity, Amherst, NY. 14260
H.S. Kwok
Affiliation:
State University of New York at Buffalo, Institute on Superconductivity, Amherst, NY. 14260
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Abstract

The electric resistance was measured in real time during laser evaporation deposition of superconducting thin films. It was found that different substrates led to different behaviors in the temporal change of the resistance. The results are consistent with the processes of nucleation, interface reaction and bulk‐like growth. Structural transformation was also observed due to oxygen backfilling at the final stage of the deposition.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 169: Symposium M – High Temperature Superconductors: Fundamental Properties and Novel Materials Processing , 1989 , 489
Copyright
Copyright © Materials Research Society 1990

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