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Structure of Al-N Films Deposited by a Quantitative Dual Ion Beam Process

Published online by Cambridge University Press:  25 February 2011

H.T.G. Hentzell ,
J.M.E. Harper  and
J.J. Cuomo
H.T.G. Hentzell
Affiliation:
IBM Thomas J. Watson Research Ctr. P.O. Box 218, YorktownHeights, NY 10598
J.M.E. Harper
Affiliation:
IBM Thomas J. Watson Research Ctr. P.O. Box 218, YorktownHeights, NY 10598
J.J. Cuomo
Affiliation:
IBM Thomas J. Watson Research Ctr. P.O. Box 218, YorktownHeights, NY 10598
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Abstract

We describe the structure of Al-N films deposited with N/Al ratios varying from 0 to 1. A dual ion beam system supplies the Al flux by inert ion sputtering, and the N flux by low energy (100–500 eV) N2+ ion bombardment of the growing film. For N/Al < 1, a cermet structure forms with large Al grains mixed with AlN. Above the composition N/Al = 1, excess N is rejected from the AlN. The AlN films show a pronounced change in preferred orientation from c-axis perpendicular to the film surface, to c-axis parallel to the film surface with increasing N2+ energy

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 27: Symposium E – Ion Implantation and Ion Beam Processing of Materials , 1983 , 519
Copyright
Copyright © Materials Research Society 1984

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References

REFERENCES

1. Harper, J.M.E., Cuomo, J.J. and Hentzell, H.T.G., Appl. Phys. Lett., 43, 547 (1983).Google Scholar
2. Harper, J.M.E., Hentzell, H.T.G. and Cuomo, J.J., to be submitted toJ. Appl. Phys.Google Scholar
3. Hentzell, H.T.G., Harper, J.M.E. and Cuomo, J.J., to be submitted to J. Appl. Phys.Google Scholar
4. “Inorganic Index to the Powder Diffraction File” Joint Committee on Powder Diffraction Standards, Pennsylvania (1972).Google Scholar
5. Eltoukhy, A.H. and Greene, J.E., J. Appl. Phys. 51, 8 (1980).Google Scholar