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Structural Decomposition at Sn/GaAs(001) Interface

Published online by Cambridge University Press:  21 February 2011

S. A. Nasr
Affiliation:
Department of Physics, University of Western Ontario, London, ON N6A 3K7, Canada
M. Zinke-Allmang
Affiliation:
Department of Physics, University of Western Ontario, London, ON N6A 3K7, Canada
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Abstract

Morphological studies of the system Sn/GaAs(001) are required to interpret electronic anomalies of devices which include doped III-V MBE grown thin films. Previous studies focused on the dynamics of Sn on As terminated surfaces. The current study complements those studies on a Ga terminated surface, i.e., conditions which may occur locally for short periods during MBE growth.

Sn is deposited on in-situ cleaned Ga rich GaAs(001) surfaces and the evolution of morphological structures is presented as a function of annealing temperature and Sn supersaturation. Three distinct regimes were observed, (i) a low temperature range (T ≤ 500°C) where Sn shows a propensity toward three-dimensional clustering, (ii) an intermediate temperature range (500°C ≤ T ≤ 625°C) where a transition in the morphology occurs due to strong interactions with the substrate resulting in the formation of characteristic etch-patterns and (iii) a high temperature regime (T ≥ 650°C) where the thermal decomposition of GaAs dominates while the deposited Sn desorbs fast.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

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References

REFERENCES

1 Harris, J. J., Joyce, B. A, Gowers, J. P. and Neave, J. H., Appl. Phys. A28, 63 (1982).Google Scholar
2 Zinke-Allmang, M., Feldman, L. C. and van Saarloos, W., Phys. Rev. Lett. 68, 2358 (1992); T. D. Lowes and M. Zinke-Allmang, J. Appl. Phys. 73, 4937 (1993).Google Scholar
3 Lifshitz, I. M. and Slyozov, V. V., J. Phys. Chem. Solids 19, 35 (1961); B. K. Chakraverty, J. Phys. Chem. Solids 28, 2401 (1967).Google Scholar
4 Zinke-Allmang, M., Feldman, L. C. and Grabow, M. H., Surf. Sci. Rept. 16, 377 (1992).Google Scholar
5 Lowes, T. D., Scan. Microscopy 8, 773 (1994).Google Scholar
6 Ito, H. and Ishibashi, T., Jpn. J. Appl. Phys. 26, L1760 (1987).Google Scholar