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Structural and Ferromagnetic Properties of Fe3Si Thin Films Sputter-Deposited on Si(001)

Published online by Cambridge University Press:  31 January 2011

Siao Li LIEW ,
Debbie Hwee Leng SENG ,
Hui Ru TAN  and
Dongzhi CHI
Siao Li LIEW
Affiliation:
sl-liew@imre.a-star.edu.sg, IMRE, Singapore, Singapore
Debbie Hwee Leng SENG
Affiliation:
debbie-seng@imre.a-star.edu.sg, IMRE, Singapore, Singapore
Hui Ru TAN
Affiliation:
dz-chi@imre.a-star.edu.sg, IMRE, Singapore, Singapore
Dongzhi CHI
Affiliation:
dz-chi@imre.a-star.edu.sg, IMRE, Singapore, Singapore
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Abstract

Fe3Si thin films were deposited on Si(001) from magnetron sputtering with varying deposition rates and subjected to post-deposition anneal (PDA). Structural investigations via XRD, SIMS and cross-sectional TEM reveal that high rate-deposited Fe3Si is amorphous while low rate-deposited Fe3Si is poly-crystalline with significant differences observed at the Fe3Si/Si interfaces. The structural differences were attributed to the influence of deposition rate on the grain nucleation and microstructural morphology in the as-deposited Fe3Si and the subsequent annealed films which in turn determine the ferromagnetic properties. Magnetic properties of Fe3Si deposited at high rate degrade with PDA - coercive field Hc increases from 1 to 14 Oe while saturation magnetization Ms decreases from ˜940 to 590 emu/cm3. In contrast, Fe3Si film sputter-deposited at low rate has a Hc of 5 Oe, Ms of ˜920 emu/cm3 and remnant magnetization Mr ˜0.9Ms that are maintained even upon PDA at 350 oC.

Keywords

ferromagneticstructuralthin film
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 1183: Symposium FF – Novel Materials and Devices for Spintronics , 2009 , 1183-FF10-15
Copyright
Copyright © Materials Research Society 2009

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