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State-of-the-Art X-Ray Photoelectron Spectroscopy (XPS): Conventional and Synchrotron X-Ray Sources for Micro-XPS

Published online by Cambridge University Press:  10 February 2011

E. L. Principe ,
R. W. Odom ,
A. L. Johnson ,
G. D. Ackermann ,
Z. Hussain  and
H. Padmore
E. L. Principe
Affiliation:
Charles Evans & Associates, Redwood City, CA 94063
R. W. Odom
Affiliation:
Charles Evans & Associates, Redwood City, CA 94063
A. L. Johnson
Affiliation:
Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720
G. D. Ackermann
Affiliation:
Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720
Z. Hussain
Affiliation:
Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720
H. Padmore
Affiliation:
Advanced Light Source, Lawrence Berkeley National Laboratory, Berkeley, CA 94720
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Abstract

This paper presents preliminary data on analyses of selected materials using two state-ofthe- art XPS systems: the Physical Electronics Inc. (PHI, Eden Prairie, MN) Quantum 2000 instrument and the microXPS beamline (7.3.2.1) at the Advanced Light Source (ALS). This research compares and contrasts relevant performance characteristics of the two systems including elemental and chemical state detection sensitivity, imaging capabilities including lateral resolution and useful image fields, role of X-ray dose damage to surface, analysis speed as well as analytical throughput.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 524: Symposium V – Application of Synchrotron Radiation Techniques…IV , 1998 , 221
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

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