Hostname: page-component-7479d7b7d-fwgfc Total loading time: 0 Render date: 2024-07-12T02:17:15.086Z Has data issue: false hasContentIssue false

Sputtered SiO2:C Films Showing Visible Photoluminescence

Published online by Cambridge University Press:  10 February 2011

M. Sendova-Vassileva
Affiliation:
CL SENES, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee, BG-1784, Sofia, Bulgaria, photomat@bgearn.bitnet
N. Tzenov
Affiliation:
CL SENES, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee, BG-1784, Sofia, Bulgaria, photomat@bgearn.bitnet
D. Dimova-Malinovska
Affiliation:
CL SENES, Bulgarian Academy of Sciences, 72 Tzarigradsko Chaussee, BG-1784, Sofia, Bulgaria, photomat@bgearn.bitnet
K. V. Josepovits
Affiliation:
Physical Institute of the Technical University of Budapest, H- 1521 Budapest, Hungary
Get access

Abstract

Luminescent a-Si:O:C layers were obtained by magnetron co-sputtering and annealing. Maximum photoluminescence intensity is comparable to that of porous silicon. Luminescence maximum is between 1.8 eV and 2.2 eV. X-ray photoelectron spectroscopy (XPS) finds Si-O, C-Si and C-C bonding. Secondary ion mass spectrometry(SIMS) data are presented.

Type
Research Article
Copyright
Copyright © Materials Research Society 1996

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

1. Maeda, Y., Tsukamoto, N. and Yazawa, Y., Appl. Phys. Lett. 59, 3168 (1991).Google Scholar
2. Kanemitsu, Y., Uto, H. and Masumoto, Y., Appl. Phys. Lett. 61, 2187 (1992).Google Scholar
3. Maeda, Y., Phys. Rev. B 51, 1658 (1995).Google Scholar
4. Hayashi, S., Nagareda, T., Kanzawa, Y. and Yamamoto, K., Jpn. J. Appl. Phys. 32, 3840 (1993).Google Scholar
5. Kanemitsu, Y., Phys. Rev. B 49, 16845 (1994).Google Scholar
6. Kanemitsu, Y., J. Non-Cryst. Solids 164–166, 639 (1993).Google Scholar
7. Hayashi, S., Kataoka, M. and Yamamoto, K., Jpn. J. Appl. Phys. 32, L274 (1993).Google Scholar
8. Hayashi, S., Kataoka, M., Kanazawa, Y. and Yamamoto, K., in 22nd International Conference on the Physics of Semiconductors. Vancouver, Canada, August 15 – 19, 1994, edited by Lockwood, D.J. (World Scientific, Singapore, 1994) Volume3, p. 2023.Google Scholar
9. Prabhakaran, K., Nishioka, T., Sumitomo, K., Kobayashi, Y. and Ogino, T., Appl. Phys. Lett. 63, 864 (1993).Google Scholar
10. Sendova-Vassileva, M., Tzenov, N., Dimova-Malinovska, D., Ts. Marinova and V. Krastev,, Thin Solid Films, in pressGoogle Scholar
11. Dillon, R.O. and Woollam, J.A., Phys. Rev. B 29, 3482 (1984).Google Scholar
12. Bensch, W. and Bergholz, W., Semicond. Sci. Technol. 5, 421 (1990).Google Scholar
13. Rochet, F., Dufour, G., Roulet, H., Pelloie, B., Perriere, J., Fogarassy, E., A, Slaoui and M. Froment, Phys. Rev. B 37, 6468 (1988).Google Scholar
14. Shimoo, T., Takemura, M., Okamura, K., Kurachi, Y., Kajiwara, M., J. Ceram. Soc. Jpn. 102, 880 (1994).Google Scholar
15. Siebert, W., Carius, R., Fuhs, W. and Jahn, K., phys. stat. sol. (b) 140, 311 (1987).Google Scholar
16. Ito, H., Kawakyu, Y., Higuchi, T. and Ide, K., Journal of Non-Crystalline Solids 59&60, 585 (1983).Google Scholar
17. Griscom, D.L., J. Ceram. Soc. Jpn. 99, 923 (1991).Google Scholar
18. Kontkiewicz, A.J., Kontkiewicz, A.M., Siejka, J., Sen, S., Nowak, G., Hoff, A.M., Sakthivel, P., Ahmed, K., Mukherjee, P., Witanachch, S. and Lagowski, J., Appl. Phys. Lett. 65, 1436 (1994).Google Scholar