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A Spectroscopic Study of the Conditions Required for Plasma Etching of Aluminium in BCl3 and Cl2 Plasmas

Published online by Cambridge University Press:  25 February 2011

J. A. Cairns ,
R. Smailes ,
D. C. W. Blaikley ,
P. M. Banks ,
G. Hancock ,
I. Hussla  and
W. Katzschner
D. C. W. Blaikley
Affiliation:
Engineering Sciences Division, Harwell Laboratory, United Kingdom Atomic Energy Authority, Oxfordshire OXI ORA, England.
G. Hancock
Affiliation:
Department of Physical Chemistry, University of Oxford, South Parks Road, Oxford OXI 3QZ, England.
I. Hussla
Affiliation:
Leybold-Heraeus GmbH, Wilhelm-Rohn-Strasse 25, D-6450 Hanau 1, W. Germany.
W. Katzschner
Affiliation:
Fraunhofer Institut fur Mikrostrukturtechnik, Dillenburger Strasse 53, D-1000 Berlin 33, W. Germany.
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Abstract

Optical Emission Spectroscopy (OES) with argon actinometry has been used to study the influence of machine parameters on the composition of a BCl3 RF plasma discharge in the absence and presence of aluminium. Two steady state models are proposed to account for the appearance of the various species seen, and to explain their relative abundances in response to changes in power and pressure. The validity of the actinometric technique for measuring relative changes in ground state concentrations is discussed also.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 98: Symposium K – Plasma Processing and Synthesis of Materials II , 1987 , 121
Copyright
Copyright © Materials Research Society 1987

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References

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