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Self-assembled PS-PMMA nanodot array pattern arranged in a parallelogram guide

Published online by Cambridge University Press:  26 February 2011

Kaori Kimura  and
Masatoshi Sakurai
Kaori Kimura
Affiliation:
kaori.kimura@toshiba.co.jp, Toshiba Corporation, Corporate Research and Development Center, 1, Komukai Toshiba-cho, Saiwai-ku, Kawasaki, Kanagawa, 212-8582, Japan, +81-44-549-2381, +81-44-520-1802
Masatoshi Sakurai
Affiliation:
masatoshi.sakurai@toshiba.co.jp, Toshiba Corporation, Corporate Research and Development Center, Japan
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Abstract

Mask patterns for XY-type magnetic patterned media using phase separation of polystyrene-polymethylmethacrylate (PS-PMMA) block copolymer were fabricated. Parallelogram guides molded by the nanoimprint lithography controlled the PS-PMMA self-assembling pattern that formed in the guide area. 45nm-pitch defect-free PS-PMMA dot patterns were obtained within a 1μm × 1μm area by optimizing the PS-PMMA film thickness.

Keywords

self-assemblypolymerfilm
Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 901: Symposium R – Assembly at the Nanoscale – Toward Functional Nanostructured Materials , 2005 , 0901-Ra05-05-Rb05-05
Copyright
Copyright © Materials Research Society 2006

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