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Scaling Properties of Submonolayer Growth Including Evaporation and Defects

Published online by Cambridge University Press:  15 February 2011

H. Larralde ,
P. Jensen ,
M. Meunier  and
A. Pimpinelli
H. Larralde
Affiliation:
Instituto de Física, Lab. de Cuernavaca, U.N.A.M., Apdo. Postal 48–3, C.P. 62251, Cuernavaca, Mor., Mexico
P. Jensen
Affiliation:
Département de Physique des Matériaux, Université Claude Bernard Lyon-1, 69622 Villeurbanne Cédex, France
M. Meunier
Affiliation:
Département de Physique des Matériaux, Université Claude Bernard Lyon-1, 69622 Villeurbanne Cédex, France
A. Pimpinelli
Affiliation:
Institut Laue-Langevin, B.P. 156X, F-38042 Grenoble Cedex 9, France
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Abstract

We present a model for thin film growth by particle deposition that takes into account the possible evaporation of the particles deposited on the surface as well as the effect of point defects. Our focus is on the early formation kinetics of two-dimensional islands on the surface, in particular in the scaling properties of the maximum number of islands formed on the surface. Most of our results are obtained through the analysis of rate equations describing the system. They are supported by simple scaling arguments and are confirmed by extensive computer simulations. We find significant differences with previous studies of this system which arise from different physical hypotheses concerning the mechanisms of island growth in the presence of evaporation.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 440: Symposia CA – Structure and Evolution of Surfaces , 1996 , 253
Copyright
Copyright © Materials Research Society 1997

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