Hostname: page-component-5c6d5d7d68-tdptf Total loading time: 0 Render date: 2024-08-21T02:21:06.689Z Has data issue: false hasContentIssue false
  • English
  • Français

Roles of Gas Phase and Surface Photolysis in Laser Chemical Vapor Deposition from Fe(CO)5

Published online by Cambridge University Press:  21 February 2011

Xin Xu  and
J.I. Steinfeld
Xin Xu
Affiliation:
Department of Chemistry, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, U.S.A.
J.I. Steinfeld
Affiliation:
Department of Chemistry, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, U.S.A.
Get access

Abstract

The chemical state of the carbon and oxygen incorporated in iron films formed by laser photolysis of Fe(CO)5 has been examined by profiling XPS analysis. A significant portion of the codeposited CO is photodissociated at the growing surface.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 158: Symposium B – In-Situ Patterning: Selective Area Deposition and Etching , 1989 , 175
Copyright
Copyright © Materials Research Society 1990

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Ehrlich, D.J., Osgood, R.M. Jr., and Deutsch, T.F., J. Electrochem. Soc 128, 2039 (1981).Google Scholar
2. Allen, S.D. and Tringubo, A.B., J. Appl.Phys. 54, 1641 (1981).Google Scholar
3. Solanki, R., Boyer, P.K., and Collins, G.J., Appl. Phys. Letts. 41, 1048 (1982).Google Scholar
4. Creighton, J.R., J. Appl. Phys. 59, 410 (1986).Google Scholar
5. Flynn, D.K., Steinfeld, J.I., and Sethi, D.S., J. Appl. Phys. 59, 3914 (1986).Google Scholar
6. Gluck, N.S., Wolga, G.J., Bartosch, C.E., Ho, W., and Ying, Z., J. Appl. Phys. 61, 998 (1987).Google Scholar
7. Gluck, N.S., Ying, Z., Bartosch, C.E., and Ho, W., J. Chem. Phys. 86, 4957 (1987).Google Scholar
8. Jackson, R.L. and Tyndall, G.W., J. Appl. Phys. 64, 2092 (1988).Google Scholar
9. Love, P.J., Loda, R.T., Rosenberg, R.A., Green, A.K., and Rehn, V., In Laser Assisted Deposition. Etching. and Doping, SPIE Proc. 459, 25 (1984).Google Scholar
10. George, P.M. and Beauchamp, J.L., Thin Solid Films 67, L25 (1980).Google Scholar
11 (a) Foord, J.S. and Jackman, R.B., Chem. Phys. Letts. 112 190 (1984); (b) R.B. Jackman and J.S. Foord, Surf. Science, 209, 151 (1989).Google Scholar
12. Singmaster, K.A., Houle, F.A., and Wilson, R.J., Appl. Phys. Letts. 53, 1048 (1988).Google Scholar
13 (a) Nathanson, G., Gitlin, B., Rosan, A.M., and Yardley, J.T., J. Chem. Phys. 74, 361 (1981); (b) J.T. Yardley, R. Gitlin, G. Nathanson, and A.M. Rosan, J. Chem. Phys., 370.Google Scholar
14. Waller, I.M., Davis, H.F., and Hepburn, J.W., J. Phys. Chem. 91, 506 (1987).Google Scholar
15. Ray, U., Brandow, S.L., Bandukwalla, G., Venkataraman, B.K., Zhang, Z., and Vernon, M., J. Chem. Phys. 89, 4052 (1988).Google Scholar
16. Venkataraman, B.K., Bandukwalla, G., Zhang, Z., and Vernon, M., J. Chem. Phys. 90, 5510 (1989).Google Scholar
17. Celii, F.G., Whitmore, PP.M., and Janda, K.C., Chem. Phys. Letts. 138, 257 (1987).Google Scholar
18. Swanson, J.R., Friend, C.M., and Chabal, Y.J., J. Chem. Phys. 87, 5028 (1987).Google Scholar
19. Zaera, F., J. Vac. Sci. Tech. A7, 642 (1989).Google Scholar
20. Anthony, M.T., in Practical Surface Analysis, Briggs, D. and Seah, M., Eds. (J. Wiley and Sons, New York, 1983, p. 431).Google Scholar
21. Moon, D.W., Dwyer, D.J., and Bernasek, S.L., Surf. Science, 163, 215 (1985).Google Scholar
22. Burgess, D. Jr., Stair, P.C., and Weitz, E., J. Vac. Sci. Tech. A4, 1362 (1986).Google Scholar
23. Baeri, P. and Camisano, S.U., in Laser Annealing of Semiconductors, Poate, J.M. and Mayer, J.W., eds., (Academic Press, New York, 1982, p. 78).Google Scholar
24. Lu, J.-P., Albert, M.R., and Bernasek, S.L., Surf. Science 217, 55 (1989).Google Scholar
25. Whitman, L.J., Gurney, B.A., Richter, L.F., Villarubia, J.S., and Ho, W., J. Vac. Sci. Tech. A5, 538 (1987).Google Scholar
26. Benndorf, C., Krüger, B., and Thieme, F., Surf. Sci. 163, L675 (1985).Google Scholar
27. Moon, D.W., Bernasek, S.L., Dwyer, D.J., and Gland, J.L., J. Am. Chem. Soc. 107, 4364 (1985).Google Scholar
28. Zaera, F., Kellin, E., and Gland, J.L., Chem. Phys. Letts. 121, 464 (1985).Google Scholar
29. Fulmer, J.P., Zaera, F., and Tysoe, W.J., J. Chem. Phys. 87, 7265 (1987).Google Scholar
30. Shinn, N.D. and Madey, T.E., Phys. Rev. Letts. 53, 2481 (1985).Google Scholar
31. Zavitsas, A.A., J. Phys. Chem. 91 5573 (1987).Google Scholar
32. Guo, X., Hanley, L., and Yates, J.T. Jr., J. Chem. Phys. 90 5200 (1989).Google Scholar
33. Ying, Z.C. and Ho, W., J. Chem. Phys. 91, 2689 (1989).Google Scholar
34. In a recent XPS study of Cr films photodeposited from Cr (CO)6 at 248nm, Nowak etal. [Applied Surf Sci., in press] have also found significant amounts of C and O in the carbide and oxide forms.Google Scholar
35. Xu, Xin and Steinfeld, J. I., in preparation.Google Scholar