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Role of Crystallinity In Roughness of Ru/c Multilayers -An Amorphization Study

Published online by Cambridge University Press:  15 February 2011

C. C. Walton  and
J. B. Kortright
C. C. Walton
Affiliation:
Center for X-Ray Optics, Lawrence Berkeley Laboratory, Berkeley, California 94720 Department of Materials Science and Mineral Engineering, University of California, Berkeley California 94720
J. B. Kortright
Affiliation:
Center for X-Ray Optics, Lawrence Berkeley Laboratory, Berkeley, California 94720
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Abstract

Single Ru films and Ru/C multilayers were sputtered on silicon substrates, in 2.5 mtorr Ar/O2 atmospheres with oxygen mole fractions from 0 to 5%. Reflectivities of the films were measured near 100eV and at 8048eV (CuKα). Critical angle measurements of the single films showed a loss of optical density consistent with full oxidation in the Ar/5%O2 sputtering atmosphere. Soft x-ray reflectivity of the multilayers was reduced from 24% with no added oxygen to < 1% for Ar/5%O2. Diffraction of CuKα x-rays and plan-view TEM showed that the added oxygen reduced Ru crystal size in all films but did not fully amorphize the Ru layers.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 382: Symposium G – Structure and Properties of Multilayered Thin Films , 1995 , 369
Copyright
Copyright © Materials Research Society 1995

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References

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